Enhancing aspect profile of half-pitch 32 nm and 22 nm lithography with plasmonic cavity lens

Applied Physics Letters

Volumn 106, Issue 9, 2015, Pages

  Gao, Ping ^a   Yao, Na ^a   Wang, Changtao ^a   Zhao, Zeyu ^a   Luo, Yunfei ^a   Wang, Yanqin ^a   Gao, Guohan ^a   Liu, Kaipeng ^a   Zhao, Chengwei ^a   Luo, Xiangang ^a  

^a INSTITUTE OF GEOLOGY AND GEOPHYSICS   (China)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTROMAGNETIC WAVE REFLECTION; LITHOGRAPHY; METALLIC FILMS; PHOTORESISTS; SILVER; SURFACE PLASMON RESONANCE;

ETCHING STEP; EVANESCENT WAVE; HALF PITCHES; PLASMONIC LITHOGRAPHY; PROFILE DEPTH; RESIST PATTERN; SCATTERING LOSS; SILVER LAYER;

PLASMONS;

EID: 84924162341     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.4914000     Document Type: Article

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