High contrast superlens lithography engineered by loss reduction

Advanced Functional Materials

Volumn 22, Issue 18, 2012, Pages 3777-3783

  Liu, Hong ^a   Wang, Bing ^a   Ke, Lin ^a   Deng, Jie ^a   Choy, Chan Chum ^a   Zhang, Ming Sheng ^b   Shen, Lu ^a   Maier, Stefan A ^c   Teng, Jing Hua ^a  

^a INSTITUTE OF MATERIALS RESEARCH AND ENGINEERING   (Singapore)

^b DATA STORAGE INSTITUTE   (Singapore)

^c IMPERIAL COLLEGE LONDON   (United Kingdom)

Author keywords

high contrast; nanolithography; scattering loss; seed layer; superlens; surface roughness

Indexed keywords

ANALYTICAL METHOD; DAMPING LOSS; HIGH CONTRAST; INTERFACIAL ROUGHNESS; KEY FACTORS; LOSS REDUCTION; OPTICAL IMAGING; POTENTIAL TOOL; RESIST PROFILE; SCATTERING LOSS; SEED LAYER; SMOOTH INTERFACE; SUB-50 NM; SUB-DIFFRACTION LIMIT; SUPERLENSES; SUPERLENSING;

NANOLITHOGRAPHY; SILVER REFINING; SURFACE ROUGHNESS;

PHOTOLITHOGRAPHY;

EID: 84866487288     PISSN: 1616301X     EISSN: 16163028     Source Type: Journal    
DOI: 10.1002/adfm.201200788     Document Type: Article

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