High aspect subdiffraction-limit photolithography via a silver superlens

Nano Letters

Volumn 12, Issue 3, 2012, Pages 1549-1554

  Liu, Hong ^a   Wang, Bing ^a   Ke, Lin ^a   Deng, Jie ^a   Chum, Chan Choy ^a   Teo, Siew Lang ^a   Shen, Lu ^a   Maier, Stefan A ^b   Teng, Jinghua ^a  

^a INSTITUTE OF MATERIALS RESEARCH AND ENGINEERING   (Singapore)

^b IMPERIAL COLLEGE LONDON   (United Kingdom)

Author keywords

aspect ratio; nanophotolithography; subdiffraction limit; Superlens; surface plasmons; surface roughness

Indexed keywords

ANALYSIS AND SIMULATION; COST-EFFECTIVE APPROACH; DATA STORAGE INDUSTRY; GRAY SCALE; MASS PATTERNING; NANOPATTERNING; NANOPHOTOLITHOGRAPHY; PROFILE DEPTH; SILVER SUPERLENS; SMOOTH INTERFACE; SUB-50 NM; SUBDIFFRACTION-LIMIT; SUPERLENSES; SURFACE PLASMONS;

ASPECT RATIO; SURFACE ROUGHNESS;

PHOTOLITHOGRAPHY;

NANOMATERIAL; SILVER; TITANIUM; TITANIUM DIOXIDE;

ARTICLE; CHEMISTRY; EQUIPMENT; EQUIPMENT DESIGN; INSTRUMENTATION; NANOTECHNOLOGY; OPTICAL INSTRUMENTATION; PARTICLE SIZE; PHOTOGRAPHY; ULTRASTRUCTURE;

EQUIPMENT DESIGN; EQUIPMENT FAILURE ANALYSIS; LENSES; NANOSTRUCTURES; NANOTECHNOLOGY; PARTICLE SIZE; PHOTOGRAPHY; SILVER; TITANIUM;

EID: 84858260495     PISSN: 15306984     EISSN: 15306992     Source Type: Journal    
DOI: 10.1021/nl2044088     Document Type: Article

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