Cyclic chemical vapor deposition of nickel ferrite thin films using organometallic precursor combination

ECS Journal of Solid State Science and Technology

Volumn 3, Issue 11, 2014, Pages P345-P352

  Yang, Y ^a   Tao, Q ^a   Srinivasan, G ^b   Takoudis, C G ^a,c  

^a University of Illinois at Chicago   (United States)

^b OAKLAND UNIVERSITY   (United States)

^c University of Illinois at Chicago   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 84923779961     PISSN: 21628769     EISSN: 21628777     Source Type: Journal    
DOI: 10.1149/2.0061411jss     Document Type: Article

References (47)

1. D. W. Healy and R. A. Johnson, Physical Review, 104, 634 (1956).
2. L. G. V. Uitert, The Journal of Chemical Physics, 24, 306 (1956).
3. A. Verma, T. C. Goel, R. G. Mendiratta, and R. G. Gupta, Journal of Magnetism and Magnetic Materials, 192, 271 (1999).
4. A. Kale, S. Gubbala, and R. D. K. Misra, Journal of Magnetism and Magnetic Materials, 277, 350 (2004).
5. N. V. Karyakin, M. S. Kozlova, M. S. Sheiman, G. P. Kamelova, and V. N. Larina, Zhurnal Fizicheskoi Khimii, 77, 1375 (2003).
6. C.-C. Lee and J.-M. Wu, Electrochemical and Solid-State Letters, 10, G58 (2007).
7. C. Ederer and N. Spaldin, Physical Review B, 71, 1 (2005).
8. G. Catalan and J. F. Scott, Advanced Materials, 21, 2463 (2009).
9. M. Avellaneda and G. Harshe, Journal of Intelligent Material Systems and Structures, 5, 501 (1994).
10. C. A. F. Vaz, J. Hoffman, C. H. Ahn, and R. Ramesh, Advanced Materials, 22, 2900 (2010).
11. V. M. Petrov, G. Srinivasan, M. I. Bichurin, and A. Gupta, Physical Review B, 75, 224407 (2007).
12. Y. Zhang, C.-Y. Deng, J. Ma, Y.-H. Lin, and C.-W. Nan, Chinese Physics B, 17, 3910 (2008).
13. D. R. Patil and B. K. Chougule, J. Mater. Sci.: Mater Electron, 20, 398 (2009).
14. S. P. Crane, C. Bihler, M. S. Brandt, S. T. B. Goennenwein,M.Gajek, and R. Ramesh, Journal of Magnetism and Magnetic Materials, 321, L5 (2009).
15. A. G. Fitzgerald and R. Engin, Thin Solid Films, 20, 317 (1974).
16. S. Ito, H. Miyashita, and N. Yoneda, Journal of Crystal Growth, 73, 167 (1985).
17. H. Itoh, T. Uemura, H. Yamaguchi, and S. Naka, Journal of Materials Science, 24, 3549 (1989).
18. P. A. Lane, P. J. Wright, M. J. Crosbie, A. D. Pitt, C. L. Reeves, B. Cockayne, A. C. Jones, and T. J. Leedham, Journal of Crystal Growth, 192, 423 (1998).
19. R. Datta, B. Loukya, N. Li, and A. Gupta, Journal of Crystal Growth, 345, 44 (2012).
20. N. Li, N. Wang, Y.-H. A;, M. N. Iliev, T. M. Klein, and A. Gupta, Chemical Vapor Deposition, 17, 261 (2011).
21. L. Brissonneau, Chemical Vapor Deposition, 5, 135 (1999).
22. M. K. Singh, Y. Yang, and C. G. Takoudis, Journal of The Electrochemical Society, 155, D618 (2008).
23. M. Singh, Y. Yang, G. C. Takoudis, A. Tatarenko, G. Srinivasan, P. Kharel, and G. Lawes, Electrochemical and Solid-State Letters, 12, H161 (2009).
24. S. Behrens, H. Bönnemann, N. Matoussevitch, E. Dinjus, H. Modrow, N. Palina, M. Frerichs, V. Kempter, W. Maus-Friedrichs, and A. Heinemann, et al, Z. Phys. Chem., 220, 3 (2006).
25. C. Bedoya, G. G. Condorelli, G. Anastasi, A. Baeri, F. Scerra, I. L. Fragala, J. G. Lisoni, and D. Wouters, Chem. Mater., 16, 3176 (2004).
26. G. Beech and R. M. Lintonbon, Thermochim. Acta, 3, 97 (1971).
27. C. Pflitsch, D. Viefhaus, U. Bergmann, V. Kravets, H. Nienhaus, and B. Atakan, Journal of The Electrochemical Society, 153, C546 (2006).
28. S. Franssila, Introduction to Microfabrication; Second Edition ed.; John Wiley & Sons, 2010.
29. J.-K. Kang and S.-W. Rhee, Thin Solid Films, 391, 57 (2001).
30. W.-C. Yeh and M. Matsumura, Japanese Journal of Applied Physics, Part 1, 36, 6884 (1997).
31. J.-K. Kang and S.-W. Rhee, Journal of Materials Research, 15, 1828 (2000).
32. B. V. Crist, Handbook of monochromatic XPS spectra, 2000; Vol. The Elements and Native Oxides.
33. S. Oswald and W. Bruckner, Surface and Interface Analysis, 36, 17 (2004).
34. N. S. McIntyre and M. G. Cook, Analytical Chemistry, 47, 2208 (1975).
35. M. C. Biesinger, B. P. Payne, A. P. Grosvenor, L. W. M. Lau, A. R. Gerson, and R. S. C. Smart, Applied Surface Science, 257, 2717 (2011).
36. N. S. McIntyre and D. G. Zetaruk, Analytical Chemistry, 49, 1521 (1977).
37. J.-C. Dupin,D. Gonbeau, P.Vinatier, andA. Levasseur, Physical Chemistry Chemical Physics, 2, 1319 (2000).
38. G. Dixit, J. P. Singh, R. C. Srivastava,H. M. Agrawal, R. J. Choudhary, and A. Gupta, Surface and Interface Analysis, 42, 151 (2010).
39. G. Dixit, J. P. Singh, R. C. Srivastava,H. M. Agrawal, and R. J. Chaudhary, Advanced Materials Letters, 3, 21 (2012).
40. Q. Tao, A. Kueltzo, M. Singh, G. Jursich, and C. G. Takoudis, Journal of The Electrochemical Society, 158, G27 (2011).
41. K. V. P. Shafi, Y. Koltypin, A. Gedanken, R. Prozorov, J. Balogh, J. Lendvai, and I. Felner, Journal of Physics and Chemistry B, 101, 6409 (1997).
42. J. Smit and H. P. J. Wijn, Ferrite; Cleaver-Hume Press: London, 1959.
43. Y. Kinemuchi, K. Ishizaka, H. Suematsu, W. Jiang, and K. Yatsui, Thin Solid Films, 407, 109 (2002).
44. N. D. S. Mohallem and L. M. Seara, Applied Surface Science, 214, 143 (2003).
45. A. H. Morrish and K. Haneda, Journal of Applied Physics, 52, 2496 (1981).
46. S. Prasad and N. S. Gajbhiye, Journal of Alloys and Compounds, 265, 87 (1998).
47. X. Batlle and A. Labarta, Journal of Physics D: Applied Physics, 35, R15 (2002).