Growth of atomically smooth epitaxial nickel ferrite films by direct liquid injection CVD

Chemical Vapor Deposition

Volumn 17, Issue 7-9, 2011, Pages 261-269

  Li, Ning ^b   Wang, Yu Hsiang A ^a   Iliev, Milko N ^c   Klein, Tonya M ^b   Gupta, Arunava ^a  

^a UNIVERSITY OF ALABAMA   (United States)

^b University of Alabama   (United States)

^c University of Houston   (United States)

Author keywords

DLI CVD; Epitaxy; Microwave; Nickel ferrite; Surface morphology

Indexed keywords

ACETYLACETONATES; BULK VALUE; DEPOSITION TEMPERATURES; DIFFUSION BEHAVIOR; DLI-CVD; FILM MORPHOLOGY; FILM PROPERTIES; HIGH DEPOSITION RATES; LIQUID INJECTIONS; MAGNETOELECTRIC COUPLINGS; MGO(1 0 0); MICROWAVE ABSORPTION; N ,N-DIMETHYLFORMAMIDE; NI(ACAC)2; NICKEL FERRITE; OPTIMIZED PROCESS; SPECTROSCOPY MEASUREMENTS; SPINEL FERRITE FILMS; STOICHIOMETRIC COMPOSITIONS; TEMPERATURE RANGE; TUNABLE FILTERS;

AMIDES; CHEMICAL VAPOR DEPOSITION; CRYSTALS; DIRECT INJECTION; EPITAXIAL GROWTH; FERRITE; FERRITES; LIQUIDS; MICROWAVE DEVICES; MICROWAVES; MORPHOLOGY; NICKEL; RAMAN SPECTROSCOPY; SATURATION MAGNETIZATION; SURFACE MORPHOLOGY;

EPITAXIAL FILMS;

EID: 80053192073     PISSN: 09481907     EISSN: 15213862     Source Type: Journal    
DOI: 10.1002/cvde.201106930     Document Type: Article

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