Structural features of epitaxial NiFe 2O 4 thin films grown on different substrates by direct liquid injection chemical vapor deposition

Journal of Crystal Growth

Volumn 345, Issue 1, 2012, Pages 44-50

  Datta, R ^a   Loukya, B ^a   Li, N ^b   Gupta, A ^b  

^a JAWAHARLAL NEHRU CENTRE FOR ADVANCED SCIENTIFIC RESEARCH   (India)

^b UNIVERSITY OF ALABAMA   (United States)

Author keywords

A1. Defects; A1. Interfaces; A3. Chemical vapor deposition processes; B1. Oxides; B2. Magnetic materials

Indexed keywords

A3. CHEMICAL VAPOR DEPOSITION PROCESSES; ANTIPHASE DOMAINS; ATOMIC RESOLUTION; CATION ORDERING; CONTRAST AREAS; DIFFERENT SUBSTRATES; ENERGY DISPERSIVE X RAY SPECTROSCOPY; FILM-SUBSTRATE INTERFACES; HIGH GROWTH RATE; HIGH-SATURATION MAGNETIZATION; LEAD MAGNESIUM NIOBATE-LEAD TITANATES; LINE PROFILES; LIQUID INJECTIONS; OPTIMUM GROWTH CONDITIONS; SHARP INTERFACE; SRTIO; STRUCTURAL FEATURE; THREADING DISLOCATION;

CHEMICAL VAPOR DEPOSITION; CRYSTAL DEFECTS; DIRECT INJECTION; EPITAXIAL GROWTH; LEAD; LIQUIDS; MAGNESIUM; MAGNETIC MATERIALS; MAGNETIC PROPERTIES; SATURATION MAGNETIZATION; STOICHIOMETRY; SUBSTRATES; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY; VAPORS; X RAY DIFFRACTION; X RAY SPECTROSCOPY;

INTERFACES (MATERIALS);

EID: 84863421779     PISSN: 00220248     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jcrysgro.2012.02.007     Document Type: Article

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