Metallorganic chemical-vapor-deposited bife O3 films for tunable high-frequency devices

Electrochemical and Solid-State Letters

Volumn 12, Issue 5, 2009, Pages

  Singh, M ^a   Yang, Y ^a   Takoudis, C G ^a,b   Tatarenko, A ^c   Srinivasan, G ^c   Kharel, P ^d   Lawes, G ^d  

^a University of Illinois at Chicago   (United States)

^b University of Illinois at Chicago   (United States)

^c OAKLAND UNIVERSITY   (United States)

^d WAYNE STATE UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC SPECTROSCOPY; FERROELECTRIC FILMS; FERROELECTRICITY; IRON; LIQUID METALS; METALLORGANIC CHEMICAL VAPOR DEPOSITION; ORGANOMETALLICS; OZONE WATER TREATMENT; SATURATION MAGNETIZATION; VAPORS;

ATOMIC RATIOS; CHARGE LEAKAGES; DIELECTRIC CONSTANTS; ELECTRICAL MEASUREMENTS; FERROELECTRIC CHARACTERISTICS; FERROELECTRIC COUPLINGS; HIGH FREQUENCIES; LIQUID IRONS; MAGNETIC MEASUREMENTS; MAGNETIC-FIELD DEPENDENCES; POLY-CRYSTALLINE; ROOM TEMPERATURES; SPIN-REORIENTATION TRANSITIONS; TUNABLE DEVICES; TUNABLE HIGH FREQUENCIES; X-RAY PHOTOELECTRON SPECTROSCOPIES;

X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 62549107478     PISSN: 10990062     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.3080612     Document Type: Article

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