Low-pressure metallorganic chemical vapor deposition of Fe 2O3 thin films on Si(100) using n-butylferrocene and oxygen

Journal of the Electrochemical Society

Volumn 155, Issue 9, 2008, Pages

  Singh, Manish K ^a   Yang, Yi ^a   Takoudis, Christos G ^a,b  

^a University of Illinois at Chicago   (United States)

^b University of Illinois at Chicago   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

METALLORGANIC CHEMICAL VAPOR DEPOSITION; ORGANOMETALLICS;

CHEMICAL VAPORS;

LOW PRESSURE CHEMICAL VAPOR DEPOSITION;

EID: 49149097641     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.2952812     Document Type: Article

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