Growth of thin iron oxide films on Si(100) by MOCVD

Journal of the Electrochemical Society

Volumn 153, Issue 8, 2006, Pages

  Pflitsch, Christian ^a   Viefhaus, Dorothee ^a   Bergmann, Ulf ^a   Kravets, Vasyl ^a   Nienhaus, Hermann ^a   Atakan, Burak ^a  

^a UNIVERSITY OF DUISBURG ESSEN   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

AUGER ELECTRON SPECTROSCOPY; ENERGY DISPERSIVE SPECTROSCOPY; FILM GROWTH; IRON OXIDES; METALLORGANIC CHEMICAL VAPOR DEPOSITION; SCANNING ELECTRON MICROSCOPY; X RAY DIFFRACTION ANALYSIS;

GROWTH RATE; KINETICALLY CONTROLLED REGIME; OXIDE PHASES;

THIN FILMS;

EID: 33745501811     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.2205179     Document Type: Article

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