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Volumn 3, Issue 2, 2015, Pages 221-232

Exploring the mechanisms in sted-enhanced direct laser writing

(6) Fischer, Joachim a Mueller, Jonathan B a Quick, Alexander S a,b Kaschke, Johannes a Barner Kowollik, Christopher a,b Wegener, Martin a

a KARLSRUHE INSTITUTE OF TECHNOLOGY (Germany)

b KARLSRUHE INSTITUTE OF TECHNOLOGY (Germany)

Author keywords

Direct laser writing; Lithography; Multiphoton absorption; Stimulated emission depletion; Super resolution

Indexed keywords

DIFFRACTION; LASER EXCITATION; LITHOGRAPHY; MULTIPHOTON PROCESSES; PHOTOLUMINESCENCE; PHOTONS; PHOTORESISTS;

DIRECT LASER WRITING; MULTI-PHOTON ABSORPTION; NANOMETER-SCALE RESOLUTION; STIMULATED EMISSION DEPLETION; STIMULATED EMISSION DEPLETION MICROSCOPY; SUPER RESOLUTION; THREE-PHOTON EXCITATION; TWO-PHOTON EXCITATIONS;

STIMULATED EMISSION;

EID: 84923141832 PISSN: None EISSN: 21951071 Source Type: Journal
DOI: 10.1002/adom.201400413 Document Type: Article

Times cited : (80)

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