Three-dimensional multi-photon direct laser writing with variable repetition rate

Optics Express

Volumn 21, Issue 22, 2013, Pages 26244-26260

  Fischer, Joachim ^a   Mueller, Jonathan B ^a   Kaschke, Johannes ^a   Wolf, Thomas J A ^a   Unterreiner, Andreas Neil ^a   Wegener, Martin ^a  

^a KARLSRUHE INSTITUTE OF TECHNOLOGY   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

AVALANCHE IONIZATION; DIRECT LASER WRITING; EXPERIMENTAL CONDITIONS; INITIATION PROCESS; LASER REPETITION RATE; LOW REPETITION RATE; ORDERS OF MAGNITUDE; TWO-PHOTON ABSORPTIONS;

IONIZATION; PHOTOPOLYMERIZATION; TWO PHOTON PROCESSES;

PHOTONS;

EID: 84887454461     PISSN: None     EISSN: 10944087     Source Type: Journal    
DOI: 10.1364/OE.21.026244     Document Type: Conference Paper

References (30)

1. H. B. Sun, S. Matsuo, and H. Misawa, "Three-dimensional photonic crystal structures achieved with two-photonabsorption photopolymerization of resin," Appl. Phys. Lett. 74, 786-788 (1999).
2. S. Kawata, H. B. Sun, T. Tanaka, and K. Takada, "Finer features for functional microdevices," Nature 412, 697-698 (2001).
3. M. Straub and M. Gu, "Near-infrared photonic crystals with higher-order bandgaps generated by two-photon photopolymerization," Opt. Lett. 27, 1824-1826 (2002).
4. M. Deubel, G. von Freymann, M. Wegener, S. Pereira, K. Busch, and C. M. Soukoulis, "Direct laser writing of three-dimensional photonic-crystal templates for telecommunications," Nature Mater. 3, 444-447 (2004).
5. K. K. Seet, S. Juodkazis, V. Jarutis, and H. Misawa, "Feature-size reduction of photopolymerized structures by femtosecond optical curing of SU-8," Appl. Phys. Lett. 89, 024106-024106 (2006).
6. J.-F. Xing, X.-Z. Dong, W.-Q. Chen, X.-M. Duan, N. Takeyasu, T. Tanaka, and S. Kawata, "Improving spatial resolution of two-photon microfabrication by using photoinitiator with high initiating efficiency," Appl. Phys. Lett. 90, 131106-131106 (2007).
7. S. H. Park, T. W. Lim, D.-Y. Yang, R. H. Kim, and K.-S. Lee, "Improvement of spatial resolution in nanostereolithography using radical quencher," Macromol. Res. 14, 559-564 (2006).
8. M. Malinauskas, A. Zukauskas, G. Bičkauskaite, R. Gadonas, and S. Juodkazis, "Mechanisms of threedimensional structuring of photo-polymers by tightly focussed femtosecond laser pulses," Opt. Express 18, 10209-10221 (2010).
9. M. Malinauskas, P. Danilevičius, and S. Juodkazis, "Three-dimensional micro-/nano-structuring via direct write polymerization with picosecond laser pulses," Opt. Express 19, 5602-5610 (2011).
10. J. Fischer and M. Wegener, "Three-dimensional direct laser writing inspired by stimulated-emission-depletion microscopy," Opt. Mater. Express 1, 614-624 (2011).
11. J. Fischer and M. Wegener, "Three-dimensional optical laser lithography beyond the diffraction limit," Laser Photon. Rev. 7, 22-44 (2013).
12. S. W. Hell and J. Wichmann, "Breaking the diffraction resolution limit by stimulated emission: Stimulatedemission- depletion fluorescence microscopy," Opt. Lett. 19, 780-782 (1994).
13. H.-B. Sun and S. Kawata, "Two-photon laser precision microfabrication and its applications to micro-nano devices and systems," J. Lightwave Technol. 21, 624 (2003).
14. T. Baldacchini, S. Snider, and R. Zadoyan, "Two-photon polymerization with variable repetition rate bursts of femtosecond laser pulses," Opt. Express 20, 29890-29899 (2012).
15. J. B. Mueller, J. Fischer, Y. J. Mange, T. Nann, and M. Wegener, "In-situ local temperature measurement during three-dimensional direct laser writing," Appl. Phys. Lett. 103, 123107 (2013).
16. S. Eaton, H. Zhang, P. Herman, F. Yoshino, L. Shah, J. Bovatsek, and A. Arai, "Heat accumulation effects in femtosecond laser-written waveguides with variable repetition rate," Opt. Express 13, 4708-4716 (2005).
17. M. Emons, K. Obata, T. Binhammer, A. Ovsianikov, B. N. Chichkov, and U. Morgner, "Two-photon polymerization technique with sub-50 nm resolution by sub-10 fs laser pulses," Opt. Mater. Express 2, 942-947 (2012).
18. M. Malinauskas, M. Farsari, A. Piskarskas, and S. Juodkazis, "Ultrafast laser nanostructuring of photopolymers: A decade of advances," Phys. Rep., doi: 10.1016/j.physrep.2013.07.005 (2013).
19. M. Thiel, J. Fischer, G. von Freymann, and M. Wegener, "Direct laser writing of three-dimensional submicron structures using a continuous-wave laser at 532 nm," Appl. Phys. Lett. 97, 221102 (2010).
20. C. Decker and K. Moussa, "Real-time kinetic study of laser-induced polymerization," Macromolecules 22, 4455-4462 (1989).
21. J. Fischer, G. von Freymann, and M. Wegener, "The materials challenge in diffraction-unlimited direct-laserwriting optical lithography," Adv. Mater. 22, 3578-3582 (2010).
22. M. J. Frisch, G.W. Trucks, H. B. Schlegel, G. E. Scuseria, M. A. Robb, J. R. Cheeseman, G. Scalmani, V. Barone, B. Mennucci, G. A. Petersson, H. Nakatsuji, M. Caricato, X. Li, H. P. Hratchian, A. F. Izmaylov, J. Bloino, G. Zheng, J. L. Sonnenberg, M. Hada, M. Ehara, K. Toyota, R. Fukuda, J. Hasegawa, M. Ishida, T. Nakajima, Y. Honda, O. Kitao, H. Nakai, T. Vreven, J. A. Montgomery, Jr., J. E. Peralta, F. Ogliaro, M. Bearpark, J. J. Heyd, E. Brothers, K. N. Kudin, V. N. Staroverov, R. Kobayashi, J. Normand, K. Raghavachari, A. Rendell, J. C. Burant, S. S. Iyengar, J. Tomasi, M. Cossi, N. Rega, J. M. Millam, M. Klene, J. E. Knox, J. B. Cross, V. Bakken, C. Adamo, J. Jaramillo, R. Gomperts, R. E. Stratmann, O. Yazyev, A. J. Austin, R. Cammi, C. Pomelli, J. W. Ochterski, R. L. Martin, K. Morokuma, V. G. Zakrzewski, G. A. Voth, P. Salvador, J. J. Dannenberg, S. Dapprich, A. D. Daniels, . Farkas, J. B. Foresman, J. V. Ortiz, J. Cioslowski, and D. J. Fox, "Gaussian 09 Revision A.2," Gaussian Inc. Wallingford CT 2009.
23. F. Weigend, F. Furche, and R. Ahlrichs, "Gaussian basis sets of quadruple zeta valence quality for atoms H-Kr," J. Chem. Phys. 119, 12753 (2003).
24. O. F. Olaj, I. Bitai, and F. Hinkelmann, "The laser-flash-initiated polymerization as a tool of evaluating (individual) kinetic constants of free-radical polymerization, 2. The direct determination of the rate of constant of chain propagation," Macromol. Chem. Phys. 188, 1689-1702 (1987).
25. J. Fischer and M. Wegener, "Ultrafast polymerization inhibition by stimulated emission depletion for threedimensional nano lithography," Adv. Materials 24, OP65-OP69 (2012).
26. K. J. Schafer, J. M. Hales, M. Balu, K. D. Belfield, E.W. Van Stryland, and D. J. Hagan, "Two-photon absorption cross-sections of common photoinitiators," J. Photochem. Photobiol. A 162, 497-502 (2004).
27. M. Pawlicki, H. A. Collins, R. G. Denning, and H. L. Anderson, "Two-photon absorption and the design of two-photon dyes," Angew. Chem. Int. Ed. 48, 3244-3266 (2009).
28. S. Juodkazis, V. Mizeikis, K. K. Seet, M. Miwa, and H. Misawa, "Two-photon lithography of nanorods in SU-8 photoresist," Nanotechnology 16, 846 (2005).
29. D. Tan, Y. Li, F. Qi, H. Yang, Q. Gong, X. Dong, and X. Duan, "Reduction in feature size of two-photon polymerization using SCR500," Appl. Phys. Lett. 90, 071106-071106 (2007).
30. A. Pikulin and N. Bityurin, "Spatial confinement of percolation: Monte Carlo modeling and nanoscale laser polymerization," Phys. Rev. B 82, 085406 (2010).