Effects of substrate temperature on the structural, morphological, electrical and optical properties of Al and Ga co-doped ZnO thin films grown by DC magnetron sputtering

Materials Letters

Volumn 145, Issue , 2015, Pages 279-282

  Zhu, Ke ^a   Yang, Ye ^b   Song, Weijie ^b  

^a HUNAN INSTITUTE OF TECHNOLOGY   (China)

^b NINGBO INSTITUTE OF MATERIALS TECHNOLOGY AND ENGINEERING   (China)

Author keywords

Al and Ga co doped ZnO; Electrical properties; Sputtering; Substrate temperature; Thin films

Indexed keywords

ALUMINUM; CARRIER CONCENTRATION; CARRIER MOBILITY; ELECTRIC PROPERTIES; GALLIUM; GALLIUM ALLOYS; HALL MOBILITY; MAGNETRON SPUTTERING; OPTICAL PROPERTIES; OXIDE FILMS; SPUTTERING; SURFACE ROUGHNESS; THIN FILMS; ZINC OXIDE;

AVERAGE GRAIN SIZE; CO-DOPED ZNO; DC MAGNETRON SPUTTERING; DIFFERENT SUBSTRATES; ELECTRICAL AND OPTICAL PROPERTIES; GLASS SUBSTRATES; SUBSTRATE TEMPERATURE; VISIBLE RANGE;

SUBSTRATES;

EID: 84922727305     PISSN: 0167577X     EISSN: 18734979     Source Type: Journal    
DOI: 10.1016/j.matlet.2015.01.130     Document Type: Article

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