SCOPUS 정보 검색 플랫폼

Volumn 101, Issue , 2014, Pages 250-256

The effects of thickness on the electrical, optical, structural and morphological properties of Al and Ga co-doped ZnO films grown by linear facing target sputtering

(5) Seo, Ki Won a Shin, Hyun Su a Lee, Ju Hyun a Chung, Kwon Bum b Kim, Han K a

a Kyung Hee University (South Korea)

b Dankook University (South Korea)

Author keywords

Al and Ga co doped ZnO; Linear facing target sputtering; Thickness

Indexed keywords

CO-DOPED ZNO; COLUMNAR STRUCTURES; CRITICAL THICKNESS; EFFECTS OF THICKNESS; FACING TARGET SPUTTERING; MORPHOLOGICAL PROPERTIES; STRUCTURAL AND MORPHOLOGICAL PROPERTIES; THICKNESS; GAN LIGHT-EMITTING DIODES;

ALUMINUM; FACINGS; FILM GROWTH; GALLIUM NITRIDE; LIGHT EMITTING DIODES; METALLIC FILMS; OPACITY; OPTIMIZATION; ZINC OXIDE;

ELECTRIC PROPERTIES; LIGHT EMITTING DIODES;

EID: 84885131724 PISSN: 0042207X EISSN: None Source Type: Journal
DOI: 10.1016/j.vacuum.2013.09.009 Document Type: Article

Times cited : (43)

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