Effect of deposition temperature on the properties of Al-doped ZnO films prepared by pulsed DC magnetron sputtering for transparent electrodes in thin-film solar cells

Applied Surface Science

Volumn 259, Issue , 2012, Pages 596-599

  Kim, Doo Soo ^a   Park, Ji Hyeon ^a   Shin, Beom Ki ^a   Moon, Kyeong Ju ^a   Son, Myoungwoo ^b   Ham, Moon Ho ^b   Lee, Woong ^c   Myoung, Jae Min ^a  

^a Yonsei University   (South Korea)

^b Gwangju Institute of Science and Technology (GIST)   (South Korea)

^c Changwon National University   (South Korea)

Author keywords

Al doped ZnO (AZO); Pulsed dc magnetron sputtering; Surface texturing; Transparent conductive oxide

Indexed keywords

ALUMINUM COMPOUNDS; CARRIER CONCENTRATION; CHLORINE COMPOUNDS; FILM PREPARATION; HALL MOBILITY; II-VI SEMICONDUCTORS; LIGHT SCATTERING; MAGNETRON SPUTTERING; MICROCHANNELS; OPTICAL PROPERTIES; SEMICONDUCTOR DOPING; SOLAR CELLS; THIN FILMS; TRANSPARENT ELECTRODES; WET ETCHING; ZINC OXIDE;

AL-DOPED ZNO; CRYSTALLINE QUALITY; DEPOSITION TEMPERATURES; PULSED DC MAGNETRON SPUTTERING; SCALABLE APPROACH; SURFACE-ROUGHENING; SURFACE-TEXTURING; TRANSPARENT CONDUCTIVE OXIDES;

THIN FILM SOLAR CELLS;

EID: 84866020358     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2012.07.082     Document Type: Article

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