Epitaxial ferromagnetic oxide thin films on silicon with atomically sharp interfaces

Applied Physics Letters

Volumn 105, Issue 1, 2014, Pages

  De Coux, P ^a,b   Bachelet, R ^a,e   Warot Fonrose, B ^b   Skumryev, V ^c   Lupina, L ^d   Niu, G ^d   Schroeder, T ^d   Fontcuberta, J ^a   Sanchez F ^a  

^a INSTITUT DE CIÈNCIA DE MATERIALS DE BARCELONA ICMAB CSIC   (Spain)

^b CEMES CNRS   (France)

^c UNIVERSITAT AUTÒNOMA DE BARCELONA   (Spain)

^d IHP   (Germany)

^e ECOLE CENTRALE DE LYON   (France)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMICALLY SHARP INTERFACE; FERROMAGNETIC OXIDES;

EID: 84908519188     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.4887349     Document Type: Article

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