Ferroelectric Bi3.25La0.75Ti3o12 films of uniform a-axis orientation on silicon substrates

Science

Volumn 296, Issue 5575, 2002, Pages 2006-2009

  Lee, Ho Nyung ^a   Hesse, Dietrich ^a   Zakharov, Nikolai ^a   Gösele, Ulrich ^a  

^a M P Inst fur Mikrostrukturphysik   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRODES; FILM GROWTH; POLARIZATION; PULSED LASER DEPOSITION; SILICON; SUBSTRATES;

FILM PLANES;

FERROELECTRIC THIN FILMS;

BISMUTH LANTHANUM TITANIUM OXIDE; METAL OXIDE; OXYGEN; PEROVSKITE; SILICON; STRONTIUM RUTHENIUM OXIDE; UNCLASSIFIED DRUG; YTTRIUM OXIDE; ZIRCONIUM OXIDE;

FILM; ORIENTATION; PEROVSKITE; POLARIZATION;

ARTICLE; ARTIFICIAL INTELLIGENCE; CHEMICAL REACTION KINETICS; CRYSTALLIZATION; ELECTRODE; FILM; LASER; POLARIZATION; PRESSURE; PRIORITY JOURNAL;

EID: 0037076982     PISSN: 00368075     EISSN: None     Source Type: Journal    
DOI: 10.1126/science.1069958     Document Type: Article

References (31)