Fabrication of ultra-high aspect ratio silicon nanopores by electrochemical etching

Applied Physics Letters

Volumn 105, Issue 12, 2014, Pages

  Schmidt, Torsten ^a   Zhang, Miao ^a   Yu, Shun ^a   Linnros, Jan ^a  

^a ROYAL INSTITUTE OF TECHNOLOGY   (Sweden)

Author keywords

[No Author keywords available]

Indexed keywords

ULTRA-HIGH;

EID: 84908300823     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.4896524     Document Type: Article

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