Formation of wide and deep pores in silicon by electrochemical etching

Materials Science and Engineering B: Solid-State Materials for Advanced Technology

Volumn 69, Issue , 2000, Pages 29-33

  Kleimann, P ^a   Linnros, J ^b   Petersson, S ^a  

^a ROYAL INSTITUTE OF TECHNOLOGY   (Sweden)

^b UNIVERSITÉ LYON 1   (France)

Author keywords

[No Author keywords available]

Indexed keywords

DISSOLUTION; ELECTROCHEMISTRY; ELECTROLYTES; ETCHING; MICROMACHINING;

ELECTROCHEMICAL ETCHING; WATER-ETHANOL SOLVENT MIXTURES;

SEMICONDUCTING SILICON;

EID: 0033874830     PISSN: 09215107     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0921-5107(99)00260-3     Document Type: Article

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