Mesoscale imperfections in MoS2 atomic layers grown by a vapor transport technique

Nano Letters

Volumn 14, Issue 8, 2014, Pages 4682-4686

  Liu, Yingnan ^a   Ghosh, Rudresh ^b   Wu, Di ^a   Ismach, Ariel ^b   Ruoff, Rodney ^b,c   Lai, Keji ^a  

^a UNIVERSITY OF TEXAS AT AUSTIN   (United States)

^b The University of Texas at Austin   (United States)

^c Ulsan National Institute of Science and Technology   (South Korea)

Author keywords

2D materials; atomic layers; grain boundary; mesoscopic defects; microwave impedance microscopy; Molybdenum disulfide

Indexed keywords

ATOMS; CRYSTALLINE MATERIALS; DEFECTS; GRAIN BOUNDARIES; MOLYBDENUM; MONOLAYERS; OPTICAL DATA PROCESSING;

ATOMIC LAYER; MECHANICAL EXFOLIATION; MESOSCOPIC DEFECTS; MICROWAVE IMPEDANCE; MOLYBDENUM DISULFIDE; OPTICAL MEASUREMENT; TWO-DIMENSIONAL MATERIALS; VAPOR-TRANSPORT TECHNIQUES;

MOLYBDENUM COMPOUNDS;

EID: 84906083818     PISSN: 15306984     EISSN: 15306992     Source Type: Journal    
DOI: 10.1021/nl501782e     Document Type: Article

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