-
1
-
-
78649367980
-
Highly scalable hafnium oxide memory with improvements of resistive distribution and read disturb immunity
-
Dec.
-
Y. S. Chen et al., "Highly scalable hafnium oxide memory with improvements of resistive distribution and read disturb immunity," in Proc. Int. Electron Devices Meeting, San Francisco, CA, USA, Dec. 2009, pp. 105-108.
-
(2009)
Proc. Int. Electron Devices Meeting, San Francisco, CA, USA
, pp. 105-108
-
-
Chen, Y.S.1
-
2
-
-
21644443347
-
Highly scalable non-volatile resistive memory using simple binary oxide driven by asymmetric unipolar voltage pulses
-
Technical Digest - IEEE International Electron Devices Meeting, 2004 IEDM (50th Annual Meeting)
-
I. G. Baek et al., "Highly scalable nonvolatile resistive memory using simple binary oxide driven by asymmetric unipolar voltage pulses," in Proc. IEEE Int (Pubitemid 40928360)
-
(2004)
Technical Digest - International Electron Devices Meeting, IEDM
, pp. 587-590
-
-
Baek, I.G.1
Lee, M.S.2
Seo, S.3
Lee, M.J.4
Seo, D.H.5
Suh, D.-S.6
Park, J.C.7
Park, S.O.8
Kim, H.S.9
Yoo, I.K.10
Chung, U.-I.11
Moon, J.T.12
-
3
-
-
84859214431
-
10×10 nm2 Hf/HfOx crossbar resistive RAM with excellent performance, reliability and low-energy operation
-
Dec.
-
B. Govoreanu et al., "10×10 nm2 Hf/HfOx crossbar resistive RAM with excellent performance, reliability and low-energy operation," in Proc. IEEE Int. Electron Devices Meeting, Dec. 2011, pp. 3161-3164.
-
(2011)
Proc. IEEE Int. Electron Devices Meeting
, pp. 3161-3164
-
-
Govoreanu, B.1
-
4
-
-
34547902189
-
Low-power switching of nonvolatile resistive memory using hafnium oxide
-
DOI 10.1143/JJAP.46.2175, Solid State Devices and Materials
-
H.-Y. Lee et al., "Low-power switching of nonvolatile resistive memory using hafnium oxide," Jpn. J. Appl. Phys., vol. 46, no. 4B, pp. 2175-2179, 2007. (Pubitemid 47256745)
-
(2007)
Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers
, vol.46
, Issue.4
, pp. 2175-2179
-
-
Lee, H.-Y.1
Chen, P.-S.2
Wang, C.-C.3
Maikap, S.4
Tzeng, P.-J.5
Lin, C.-H.6
Lee, L.-S.7
Tsai, M.-J.8
-
5
-
-
84855306489
-
Metal oxide resistive memory switching mechanism based on conductive filament properties
-
G. Bersuker et al., "Metal oxide resistive memory switching mechanism based on conductive filament properties," J. Appl. Phys., vol. 110, no. 12, p. 124518, 2011.
-
(2011)
J. Appl. Phys.
, vol.110
, Issue.12
, pp. 124518
-
-
Bersuker, G.1
-
6
-
-
84883312660
-
Comprehensive physical modeling of forming and switching operations in HfO2 RRAM devices
-
Dec.
-
L. Vandelli et al., "Comprehensive physical modeling of forming and switching operations in HfO2 RRAM devices," in Proc. IEEE Int. Electron Devices Meeting, Dec. 2011, pp. 1751-1754.
-
(2011)
Proc. IEEE Int. Electron Devices Meeting
, pp. 1751-1754
-
-
Vandelli, L.1
-
7
-
-
84876101296
-
Microscopic understanding and modeling of HfO2 RRAM device physics
-
Dec.
-
L. Larcher, A. Padovani, O. Pirrotta, L. Vandelli, and G. Bersuker, "Microscopic understanding and modeling of HfO2 RRAM device physics," in Proc. IEEE Int. Electron Devices Meeting, Dec. 2012, pp. 474-477.
-
(2012)
Proc. IEEE Int. Electron Devices Meeting
, pp. 474-477
-
-
Larcher, L.1
Padovani, A.2
Pirrotta, O.3
Vandelli, L.4
Bersuker, G.5
-
8
-
-
84878326260
-
Leakage current-forming voltage relation and oxygen gettering in HfOx RRAM devices
-
Jun.
-
K. G. Young-Fisher et al., "Leakage current-forming voltage relation and oxygen gettering in HfOx RRAM devices," IEEE Electron Device Lett., vol. 34, no. 6, pp. 750-752, Jun. 2013.
-
(2013)
IEEE Electron Device Lett
, vol.34
, Issue.6
, pp. 750-752
-
-
Young-Fisher, K.G.1
-
9
-
-
84864137037
-
Understanding the role of the Ti metal electrode on the forming of HfO2-based RRAMs
-
May
-
A. Padovani, L. Larcher, P. Pavan, C. Cagli, and B. D. Salvo, "Understanding the role of the Ti metal electrode on the forming of HfO2-based RRAMs," in Proc. 4th IEEE Int. Memory Workshop, IMW, Milan, Italy, May 2012, pp. 1-4.
-
(2012)
Proc. 4th IEEE Int. Memory Workshop, IMW, Milan, Italy
, pp. 1-4
-
-
Padovani, A.1
Larcher, L.2
Pavan, P.3
Cagli, C.4
Salvo, B.D.5
-
10
-
-
84874651781
-
An empirical model for RRAM resistance in low-And high-resistance states
-
Mar.
-
F. M. Puglisi, L. Larcher, G. Bersuker, A. Padovani, and P. Pavan, "An empirical model for RRAM resistance in low-And high-resistance states," IEEE Electron Device Lett., vol. 34, no. 3, pp. 387-389, Mar. 2013.
-
(2013)
IEEE Electron Device Lett.
, vol.34
, Issue.3
, pp. 387-389
-
-
Puglisi, F.M.1
Larcher, L.2
Bersuker, G.3
Padovani, A.4
Pavan, P.5
-
11
-
-
84871054582
-
Crossover from incoherent to coherent electron tunneling between defects in MgO
-
Dec.
-
K. P. McKenna and J. Blumberger, "Crossover from incoherent to coherent electron tunneling between defects in MgO," Phys. Rev. B, vol. 86, p. 245110, Dec. 2012.
-
(2012)
Phys. Rev. B
, vol.86
, pp. 245110
-
-
McKenna, K.P.1
Blumberger, J.2
-
12
-
-
84868273886
-
Transport properties of oxygen vacancy filaments in metal/crystalline or amorphous HfO2/metal structures
-
Oct.
-
X. Cartoixà, R. Rurali, and J. Suné, "Transport properties of oxygen vacancy filaments in metal/crystalline or amorphous HfO2/metal structures," Phys. Rev. B, vol. 86, p. 165445, Oct. 2012.
-
(2012)
Phys. Rev. B
, vol.86
, pp. 165445
-
-
Cartoixà, X.1
Rurali, R.2
Suné, J.3
-
13
-
-
80052078629
-
A physical model of the temperature dependence of the current through SiO2/HfO2 stacks
-
Sep.
-
L. Vandelli, A. Padovani, L. Larcher, R. G. Southwick, W. B. Knowlton, and G. Bersuker, "A physical model of the temperature dependence of the current through SiO2/HfO2 stacks," IEEE Trans. Electron Devices, vol. 58, no. 9, pp. 2878-2887, Sep. 2011.
-
(2011)
IEEE Trans. Electron Devices
, vol.58
, Issue.9
, pp. 2878-2887
-
-
Vandelli, L.1
Padovani, A.2
Larcher, L.3
Southwick, R.G.4
Knowlton, W.B.5
Bersuker, G.6
-
15
-
-
84866561026
-
Dynamic 'hour glass' model for SET and RESET in HfO2 RRAM
-
Jun.
-
R. Degraeve et al., "Dynamic 'hour glass' model for SET and RESET in HfO2 RRAM," in Proc. VLSI Technol., VLSIT, Jun. 2012, pp. 75-76.
-
(2012)
Proc. VLSI Technol., VLSIT
, pp. 75-76
-
-
Degraeve, R.1
-
16
-
-
84864936372
-
Leakage current in HfO2 stacks: From physical to compact modeling
-
Santa Clara, CA, USA
-
L. Larcher, A. Padovani, and P. Pavan, "Leakage current in HfO2 stacks: From physical to compact modeling," in Proc. NSTI-Nanotech, vol. 2. Santa Clara, CA, USA, 2012, p. 809.
-
(2012)
Proc. NSTI-Nanotech
, vol.2
, pp. 809
-
-
Larcher, L.1
Padovani, A.2
Pavan, P.3
-
17
-
-
84884800271
-
Microscopic modeling of electrical stress-Induced breakdown in poly-crystalline hafnium oxide dielectrics
-
May
-
L. Vandelli, A. Padovani, L. Larcher, and G. Bersuker, "Microscopic modeling of electrical stress-Induced breakdown in poly-crystalline hafnium oxide dielectrics," IEEE Trans. Electron Devices, vol. 60, no. 5, pp. 1754-1762, May 2013.
-
(2013)
IEEE Trans. Electron Devices
, vol.60
, Issue.5
, pp. 1754-1762
-
-
Vandelli, L.1
Padovani, A.2
Larcher, L.3
Bersuker, G.4
-
18
-
-
21144473420
-
Electron transfer reactions in chemistry. Theory and experiment
-
R. A. Marcus, "Electron transfer reactions in chemistry. Theory and experiment," Rev. Modern Phys., vol. 65, no. 3, pp. 599-610, 1993.
-
(1993)
Rev. Modern Phys.
, vol.65
, Issue.3
, pp. 599-610
-
-
Marcus, R.A.1
-
19
-
-
71949115337
-
The interaction of oxygen vacancies with grain boundaries in monoclinic HfO2
-
Nov.
-
K. McKenna and A. Shluger, "The interaction of oxygen vacancies with grain boundaries in monoclinic HfO2," Appl. Phys. Lett., vol. 95, no. 22, p. 222111, Nov. 2009.
-
(2009)
Appl. Phys. Lett.
, vol.95
, Issue.22
, pp. 222111
-
-
McKenna, K.1
Shluger, A.2
-
20
-
-
84883342733
-
A compact model of hafnium-oxide-based resistive random access memory
-
May
-
F. M. Puglisi, P. Pavan, A. Padovani, and L. Larcher, "A compact model of hafnium-oxide-based resistive random access memory," in Proc. Int. Conf. IC Des. Technol., ICICDT, May 2013, pp. 85-88.
-
(2013)
Proc. Int. Conf. IC Des. Technol., ICICDT
, pp. 85-88
-
-
Puglisi, F.M.1
Pavan, P.2
Padovani, A.3
Larcher, L.4
|