메뉴 건너뛰기




Volumn 61, Issue 8, 2014, Pages 2668-2673

A compact model of program window in HfOx RRAM devices for conductive filament characteristics analysis

Author keywords

Charge transport; compact modeling; non volatile memories.

Indexed keywords

CHARGE TRANSFER; ELECTRON DEVICES; ELECTRONICS ENGINEERING;

EID: 84905191693     PISSN: 00189383     EISSN: None     Source Type: Journal    
DOI: 10.1109/TED.2014.2329020     Document Type: Article
Times cited : (71)

References (20)
  • 1
    • 78649367980 scopus 로고    scopus 로고
    • Highly scalable hafnium oxide memory with improvements of resistive distribution and read disturb immunity
    • Dec.
    • Y. S. Chen et al., "Highly scalable hafnium oxide memory with improvements of resistive distribution and read disturb immunity," in Proc. Int. Electron Devices Meeting, San Francisco, CA, USA, Dec. 2009, pp. 105-108.
    • (2009) Proc. Int. Electron Devices Meeting, San Francisco, CA, USA , pp. 105-108
    • Chen, Y.S.1
  • 3
    • 84859214431 scopus 로고    scopus 로고
    • 10×10 nm2 Hf/HfOx crossbar resistive RAM with excellent performance, reliability and low-energy operation
    • Dec.
    • B. Govoreanu et al., "10×10 nm2 Hf/HfOx crossbar resistive RAM with excellent performance, reliability and low-energy operation," in Proc. IEEE Int. Electron Devices Meeting, Dec. 2011, pp. 3161-3164.
    • (2011) Proc. IEEE Int. Electron Devices Meeting , pp. 3161-3164
    • Govoreanu, B.1
  • 5
    • 84855306489 scopus 로고    scopus 로고
    • Metal oxide resistive memory switching mechanism based on conductive filament properties
    • G. Bersuker et al., "Metal oxide resistive memory switching mechanism based on conductive filament properties," J. Appl. Phys., vol. 110, no. 12, p. 124518, 2011.
    • (2011) J. Appl. Phys. , vol.110 , Issue.12 , pp. 124518
    • Bersuker, G.1
  • 6
    • 84883312660 scopus 로고    scopus 로고
    • Comprehensive physical modeling of forming and switching operations in HfO2 RRAM devices
    • Dec.
    • L. Vandelli et al., "Comprehensive physical modeling of forming and switching operations in HfO2 RRAM devices," in Proc. IEEE Int. Electron Devices Meeting, Dec. 2011, pp. 1751-1754.
    • (2011) Proc. IEEE Int. Electron Devices Meeting , pp. 1751-1754
    • Vandelli, L.1
  • 8
    • 84878326260 scopus 로고    scopus 로고
    • Leakage current-forming voltage relation and oxygen gettering in HfOx RRAM devices
    • Jun.
    • K. G. Young-Fisher et al., "Leakage current-forming voltage relation and oxygen gettering in HfOx RRAM devices," IEEE Electron Device Lett., vol. 34, no. 6, pp. 750-752, Jun. 2013.
    • (2013) IEEE Electron Device Lett , vol.34 , Issue.6 , pp. 750-752
    • Young-Fisher, K.G.1
  • 10
    • 84874651781 scopus 로고    scopus 로고
    • An empirical model for RRAM resistance in low-And high-resistance states
    • Mar.
    • F. M. Puglisi, L. Larcher, G. Bersuker, A. Padovani, and P. Pavan, "An empirical model for RRAM resistance in low-And high-resistance states," IEEE Electron Device Lett., vol. 34, no. 3, pp. 387-389, Mar. 2013.
    • (2013) IEEE Electron Device Lett. , vol.34 , Issue.3 , pp. 387-389
    • Puglisi, F.M.1    Larcher, L.2    Bersuker, G.3    Padovani, A.4    Pavan, P.5
  • 11
    • 84871054582 scopus 로고    scopus 로고
    • Crossover from incoherent to coherent electron tunneling between defects in MgO
    • Dec.
    • K. P. McKenna and J. Blumberger, "Crossover from incoherent to coherent electron tunneling between defects in MgO," Phys. Rev. B, vol. 86, p. 245110, Dec. 2012.
    • (2012) Phys. Rev. B , vol.86 , pp. 245110
    • McKenna, K.P.1    Blumberger, J.2
  • 12
    • 84868273886 scopus 로고    scopus 로고
    • Transport properties of oxygen vacancy filaments in metal/crystalline or amorphous HfO2/metal structures
    • Oct.
    • X. Cartoixà, R. Rurali, and J. Suné, "Transport properties of oxygen vacancy filaments in metal/crystalline or amorphous HfO2/metal structures," Phys. Rev. B, vol. 86, p. 165445, Oct. 2012.
    • (2012) Phys. Rev. B , vol.86 , pp. 165445
    • Cartoixà, X.1    Rurali, R.2    Suné, J.3
  • 15
    • 84866561026 scopus 로고    scopus 로고
    • Dynamic 'hour glass' model for SET and RESET in HfO2 RRAM
    • Jun.
    • R. Degraeve et al., "Dynamic 'hour glass' model for SET and RESET in HfO2 RRAM," in Proc. VLSI Technol., VLSIT, Jun. 2012, pp. 75-76.
    • (2012) Proc. VLSI Technol., VLSIT , pp. 75-76
    • Degraeve, R.1
  • 16
    • 84864936372 scopus 로고    scopus 로고
    • Leakage current in HfO2 stacks: From physical to compact modeling
    • Santa Clara, CA, USA
    • L. Larcher, A. Padovani, and P. Pavan, "Leakage current in HfO2 stacks: From physical to compact modeling," in Proc. NSTI-Nanotech, vol. 2. Santa Clara, CA, USA, 2012, p. 809.
    • (2012) Proc. NSTI-Nanotech , vol.2 , pp. 809
    • Larcher, L.1    Padovani, A.2    Pavan, P.3
  • 17
    • 84884800271 scopus 로고    scopus 로고
    • Microscopic modeling of electrical stress-Induced breakdown in poly-crystalline hafnium oxide dielectrics
    • May
    • L. Vandelli, A. Padovani, L. Larcher, and G. Bersuker, "Microscopic modeling of electrical stress-Induced breakdown in poly-crystalline hafnium oxide dielectrics," IEEE Trans. Electron Devices, vol. 60, no. 5, pp. 1754-1762, May 2013.
    • (2013) IEEE Trans. Electron Devices , vol.60 , Issue.5 , pp. 1754-1762
    • Vandelli, L.1    Padovani, A.2    Larcher, L.3    Bersuker, G.4
  • 18
    • 21144473420 scopus 로고
    • Electron transfer reactions in chemistry. Theory and experiment
    • R. A. Marcus, "Electron transfer reactions in chemistry. Theory and experiment," Rev. Modern Phys., vol. 65, no. 3, pp. 599-610, 1993.
    • (1993) Rev. Modern Phys. , vol.65 , Issue.3 , pp. 599-610
    • Marcus, R.A.1
  • 19
    • 71949115337 scopus 로고    scopus 로고
    • The interaction of oxygen vacancies with grain boundaries in monoclinic HfO2
    • Nov.
    • K. McKenna and A. Shluger, "The interaction of oxygen vacancies with grain boundaries in monoclinic HfO2," Appl. Phys. Lett., vol. 95, no. 22, p. 222111, Nov. 2009.
    • (2009) Appl. Phys. Lett. , vol.95 , Issue.22 , pp. 222111
    • McKenna, K.1    Shluger, A.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.