|
Volumn 58, Issue 7, 2013, Pages 203-208
|
Fundamentals in MoS2 transistors: Dielectric, scaling and metal contacts
a a a a |
Author keywords
[No Author keywords available]
|
Indexed keywords
ATOMIC LAYER DEPOSITION;
CONTACTS (FLUID MECHANICS);
MICROELECTRONICS;
OPTOELECTRONIC DEVICES;
CHANNEL LENGTH;
DEVICE APPLICATION;
DEVICE PROPERTIES;
DIELECTRIC INTEGRATION;
FERMI LEVEL PINNING;
METAL CONTACTS;
STATISTICAL STUDY;
TWO-DIMENSIONAL (2D) CRYSTALS;
TRANSISTORS;
|
EID: 84904916692
PISSN: 19385862
EISSN: 19386737
Source Type: Conference Proceeding
DOI: 10.1149/05807.0203ecst Document Type: Conference Paper |
Times cited : (19)
|
References (15)
|