Chemical trends in the work function of modified Si(111) surfaces: A DFT study

Journal of Physical Chemistry C

Volumn 118, Issue 26, 2014, Pages 14346-14354

  Arefi, Hadi H ^a,b   Fagas, Giorgos ^a  

^a UNIVERSITY COLLEGE CORK   (Ireland)

^b UNIVERSITY COLLEGE CORK   (Ireland)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL BONDS; ELECTRIC FIELDS; ELECTRONEGATIVITY; FLUORINE; IODINE; SILICON; TELLURIUM COMPOUNDS;

ATOMIC SPECIES; CHEMICAL TREND; INDUCED ELECTRIC FIELDS; MONOTONIC FUNCTIONS; SILICON (111) SURFACE; SILICON ATOMS; SILICON SURFACES; SURFACE DIPOLE MOMENT;

WORK FUNCTION;

EID: 84903790982     PISSN: 19327447     EISSN: 19327455     Source Type: Journal    
DOI: 10.1021/jp502464r     Document Type: Article

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