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Journal of Materials Chemistry A

Volumn 2, Issue 27, 2014, Pages 10662-10667

Plasma enhanced atomic layer deposition of Fe2O3 thin films

(3) Ramachandran, Ranjith K a Dendooven, Jolien a Detavernier, Christophe a

a GHENT UNIVERSITY (Belgium)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC LAYER DEPOSITION; CARBON FILMS; ORGANOMETALLICS; THIN FILMS;

BROAD TEMPERATURE RANGES; CARBON CONTAMINATION; DEPOSITED FILMS; GROWTH PER CYCLE; LOW TEMPERATURES; PLASMA-ENHANCED ATOMIC LAYER DEPOSITION; POST DEPOSITION ANNEALING; REMOTE PLASMAS;

DEPOSITION;

EID: 84902836124 PISSN: 20507488 EISSN: 20507496 Source Type: Journal
DOI: 10.1039/c4ta01486c Document Type: Article

Times cited : (47)

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