Fe2O3-TiO2 systems grown by MOCVD: An XPS study

Surface Science Spectra

Volumn 18, Issue 1, 2011, Pages 29-35

  Visentin, Francesca ^a   Gerbasi, Rosalba ^a   Rossetto, Gilberto ^a   De Zorzi, Chiara ^a   El Habra, Naida ^b   Barreca, Davide ^b   Gasparotto, Alberto ^b  

^a CNR   (Italy)

^b UNIVERSITY OF PADOVA   (Italy)

Author keywords

Composites; CVD; Fe2O3; TiO2; X ray photoelectron spectroscopy

Indexed keywords

A3. METAL ORGANIC CHEMICAL VAPOR DEPOSITION (MOCVD); GLASS SUBSTRATES; INDEPENDENT SOURCES; ISO-PROPOXIDE; SPECIMEN SURFACES; TIO; XPS ANALYSIS;

CHEMICAL VAPOR DEPOSITION; COMPOSITE MATERIALS; METALLORGANIC CHEMICAL VAPOR DEPOSITION; PHOTOELECTRONS; SUBSTRATES; SURFACE SEGREGATION; TITANIUM; TITANIUM DIOXIDE;

X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 84865708482     PISSN: 10555269     EISSN: 15208575     Source Type: Journal    
DOI: 10.1116/11.20111001     Document Type: Article

References (28)

1. S. Grayer and M. J. Halman, J. Electronanal. Chem. 170, 363 ( 1984).
2. R. Gerbasi, M. Bolzan, N. El Habra, G. Rossetto, L. Schiavi, A. Strini, and S. Barison, J. Electrochem. Soc. 156, K233 ( 2009).
3. A. J. Pruden and D. F. Ollis, J. Catal. 82, 404 ( 1983).
4. T. Nguyen and D. F. Ollis, J. Phys. Chem. 88, 386 ( 1984).
5. N. Sepone, Sol. Energy Mater. Sol. Cells 38, 369 ( 1995).
6. Y. Takahashi, A. Ogiso, R. Tomoda, K. Sugiyama, H. Minoura, and M. Tsuiki, J. Chem. Soc., Faraday Trans. 1 78, 2563 ( 1982).
7. P. Vijayan, C. Mahendiran, C. Suresh, and K. Shanthi, Catal. Today 141, 220 ( 2009).
8. R. Khan, S. W. Kim, T. J. Kim, and C. M. Nam, Mater. Chem. Phys. 112, 167 ( 2008).
9. C. Adán, A. Bahamonde, M. Fernández-García, and A. Martínez-Arias, Appl. Catal., B 72, 11 ( 2007).
10. W. C. Hung, S. H. Fu, J. J. Tseng, H. Chu, and T. H. Ko, Chemosphere 66, 2142 ( 2007).
11. J. A. Navío, G. Colón, M. Macías, C. Real, and M. I. Litter, Appl. Catal., A 177, 111 ( 1999).
12. W. Choi, A. Termin, and M. R. Hoffmann, J. Phys. Chem. 98, 13669 ( 1994).
13. M. I. Litter and J. A. Navio, J. Photochem. Photobiol., A 98, 171 ( 1996).
14. N. Serpone and D. Lawless, Langmuir 10, 643 ( 1994).
15. Pattern No. 021-1272 JCPDS, 2002.
16. M. C. Wang, H. J. Lin, and T. S. Yang, J. Alloys Compd. 473, 394 ( 2009).
17. F. Gracia, J. P. Holgado, F. Yubero, and A. R. González-Elipe, Surf. Coat. Technol. 158, 552 ( 2002).
18. N. R. Mathews, M. A. Corte Jacome, E. R. Morales, and J. A. Toledo Antonio, Phys. Status Solidi C 6, 219 ( 2009).
19. J. F. Moulder, W. F. Stickle, P. E. Sobol, and K. D. Bomben, Handbook of X-ray Photoelectron Spectroscopy (Perkin Elmer Corporation, Eden Prairie, MN/USA, 1992).
20. http://srdata.nist.gov/xps.
21. D. Barreca, G. A. Battiston, D. Berto, R. Gerbasi, and E. Tondello, Surf. Sci. Spectra 8, 240 ( 2001).
22. D. Barreca, A. Gasparotto, C. Maccato, C. Maragno, and E. Tondello, Surf. Sci. Spectra 14, 27 ( 2007).
23. D. Barreca, G. A. Battiston, U. Casellato, R. Gerbasi, and E. Tondello, J. Phys. IV 11, Pr 11-253 ( 2001).
24. D. Barreca, E. Comini, A. P. Ferrucci, A. Gasparotto, C. Maccato, C. Maragno, G. Sberveglieri, and E. Tondello, Chem. Mater. 19, 5642 ( 2007).
25. G. A. Battiston, R. Gerbasi, D. Berto, D. Barreca, and E. Tondello, Electrochem. Soc. Proc. 2003-08, 1168 ( 2003).
26. L. Armelao, D. Barreca, G. Bottaro, A. Bovo, A. Gasparotto, and E. Tondello, Surf. Sci. Spectra 10, 1 ( 2003).
27. D. Briggs and M. P. Seah, Practical Surface Analysis: Auger and X-ray Photoelectron Spectroscopy (Wiley, New York/USA, 1990).
28. D. A. Shirley, Phys. Rev. B 5, 4709 ( 1972).