Elaboration and characterization of Fe1-xO thin films sputter deposited from magnetite target

Thin Solid Films

Volumn 515, Issue 16 SPEC. ISS., 2007, Pages 6532-6536

  Mauvernay, B ^a   Presmanes, L ^a   Capdeville, S ^a   de Resende, V G ^b   De Grave, E ^b   Bonningue, C ^a   Tailhades, Ph ^a  

^a UNIVERSITÉ PAUL SABATIER   (France)

^b GHENT UNIVERSITY   (Belgium)

Author keywords

Electrical properties and measurements; Iron oxide; M ssbauer spectroscopy; Sputtering

Indexed keywords

ELECTRIC PROPERTIES; MAGNETITE; MOSSBAUER SPECTROSCOPY; NANOSTRUCTURED MATERIALS; REACTIVE SPUTTERING; SPUTTER DEPOSITION; SUBSTRATES;

ARGON GAS FLOW; PARTIAL OXYGEN PRESSURE; WUSTITE;

THIN FILMS;

EID: 34247470686     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2006.11.131     Document Type: Article

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