Chemical vapor deposition of iron and iron oxide thin films from Fe(II) dihydride complexes

Chemistry of Materials

Volumn 18, Issue 22, 2006, Pages 5150-5152

  Park, Sungho ^a   Lim, Sangho ^a   Choi, Hyungsoo ^a  

^a University of Illinois at Urbana Champaign   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

BUBBLER-TYPE PRECURSOR; COLD-WALL GLASS REACTOR; FE(II) DIHYDRIDE COMPLEXES; LIQUID NITROGEN TRAP;

AMORPHOUS FILMS; CHEMICAL VAPOR DEPOSITION; DEPOSITION; ELECTRIC REACTORS; IRON; X RAY DIFFRACTION ANALYSIS;

THIN FILMS;

EID: 33751053287     PISSN: 08974756     EISSN: None     Source Type: Journal    
DOI: 10.1021/cm0601990     Document Type: Article

References (25)

1. Vasiliev, A. A. Sens. Actuators, B 1992, 7, 626.
2. Dimitrov, D. V.; Hadjipanayis, G. C.; Papaefthymiou, V.; Simopoulos, A. IEEE Trans. Magn. 1997, 33, 4363.
3. Mathur, S.; Veith, M.; Sivakov, V.; Shen, H.; Huch, V.; Hartmann, U.; Gao, H. Chem. Vap. Deposition 2002, 8, 277.
4. Izaki, M.; Shinoura, O. Adv. Mater. 2001, 13, 142.
5. Pal, B.; Sharon, M. Thin Solid Films 2000, 379, 83.
6. Ishii, Y.; Terada, A.; Ishii, O.; Ohta, S.; Hattori, S.; Makino, K. IEEE Trans. Magn. 1980, 16, 1114.
7. Kim, Y. K.; Oliveria, M. J. Appl. Phys. 1993, 75, 431.
8. Fujii, T.; Takano, M.; Katano, R.; Bande, Y. J. Appl. Phys. 1989, 66, 3168.
9. Chen, M. M.; Oritz, C.; Lim, G.; Sigsbee, R.; Castillo, G. IEEE Trans. Magn. 1987, 15, 1549.
10. Hattori, S.; Ishii, Y.; Shinohara, M.; Nakagawa, T. IEEE Trans. Magn. 1979, 15, 1549.
11. Dhara, S.; Rastogi, A. C.; Das, B. K. Thin Solid Films 1994, 239, 240.
12. Lie, M.; Fjellvåg, H.; Kjekshus, A. Thin Solid Films 2005, 488, 74.
13. Marco de Ridder, M.; Van De Ven, P. C.; VanWelzenis, R. G.; Brongersma, H. H.; Helfensteyn, S.; Creemers, C.; Van Der Voort, P.; Baltes, M.; Mathieu, M.; Vansant, E. F. J. Phys. Chem. B 2002, 106, 13146.
14. Yubero, F.; Ocaña, M.; Justo, A.; Contreras, L.; González-Elipe, A. R. J. Vac. Sci. Technol., A 2000, 18, 2244.
15. Maruyama, T.; Shinyashiki, Y. Thin Solid Films 1998, 333, 203.
16. Fujii, E.; Torii, H.; Tomozawa, A.; Takayama, R.; Hirao, T. J. Cryst. Growth 1995, 151, 134.
17. Rastogi, A. C.; Dhara, S.; Das, B. K. J. Electrochem. Soc. 1995, 142, 3148.
18. Gerlach, D. H.; Peet, W. G.; Muetterties, E. L. J. Am. Chem. Soc. 1972, 94, 4545.
19. Choi, H.; Park, S.; Jang, H. G. J. Mater. Res. 2002, 17, 267.
20. Handbook of X-ray Photoelectron Spectroscopy; Wagner, C. D., Riggs, W. M., Davis, L. E., Moulder, J. F., Muilenger, G. E., Eds.; Perkin-Elmer: Eden Prairie, MN, 1979.
21. Choi, H.; Park, S. Chem. Mater. 2003, 15, 3121.
22. Choi, H.; Park, S.; Kim, T. H. Chem. Mater. 2003, 15, 3735.
23. Pedley, J. B.; Marshall, E. M. J. Phys. Chem. Ref. Data 1983, 12, 967.
24. Schedel-Niedrig, T.; Weiss, W.; Schlögl, R. Phys. Rev. B 1995, 52 (17), 449.
25. Gao, Y.; Kim, Y. J.; Chambers, S. A. J. Mater. Res. 1998, 13, 2003.