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Proceedings of SPIE - The International Society for Optical Engineering

Volumn 9051, Issue , 2014, Pages

Study on resist performance of chemically amplified molecular resist based on noria derivative and calixarene derivative

(3) Yamamoto, Hiroki a Kudo, Hiroto b Kozawa, Takahiro a

a OSAKA UNIVERSITY (Japan)

b KANSAI UNIVERSITY (Japan)

Author keywords

Calixarene derivative; Chemically amplified resist; Extreme ultraviolet; Molecular resist; Noria derivative

Indexed keywords

PHOTORESISTS;

CALIXARENE DERIVATIVES; CHEMICALLY AMPLIFIED; CHEMICALLY AMPLIFIED RESIST; EXTREME ULTRAVIOLET; EXTREME ULTRAVIOLETS; LITHOGRAPHIC PROCESSING; MOLECULAR RESISTS; RESIST SENSITIVITY;

PHENOLS;

EID: 84902095935 PISSN: 0277786X EISSN: 1996756X Source Type: Conference Proceeding
DOI: 10.1117/12.2046595 Document Type: Conference Paper

Times cited : (8)

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