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Volumn 8987, Issue , 2014, Pages

Growth of crystalline LaAlO3 by atomic layer deposition

Author keywords

Aluminates; Atomic layer deposition; Crystal structure; Interfaces; Reflection high energy electron diffraction; X ray diffraction

Indexed keywords

ALUMINUM COMPOUNDS; AMORPHOUS FILMS; ANNEALING; ATOMIC LAYER DEPOSITION; BUFFER LAYERS; CRYSTAL STRUCTURE; CRYSTALLINE MATERIALS; DEPOSITION; INTERFACES (MATERIALS); LANTHANUM ALLOYS; LATTICE MISMATCH; MOLECULAR BEAM EPITAXY; REFLECTION HIGH ENERGY ELECTRON DIFFRACTION; SILICON; VACUUM; X RAY DIFFRACTION; X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 84901811181     PISSN: 0277786X     EISSN: 1996756X     Source Type: Conference Proceeding    
DOI: 10.1117/12.2045532     Document Type: Conference Paper
Times cited : (4)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.