Microstructural characterization of high-quality indium tin oxide films deposited by thermionically enhanced magnetron sputtering at low temperature

Vacuum

Volumn 107, Issue , 2014, Pages 56-61

  Lan, Ying Feng ^a   Chen, Ying Hung ^a   He, Ju Liang ^a   Chang, Jing Tang ^a  

^a FENG CHIA UNIVERSITY   (Taiwan)

Author keywords

DC magnetron sputtering; Indium tin oxide; Microstructural characterization; Thermionic enhancement

Indexed keywords

DEPOSITION; ION BOMBARDMENT; MAGNETRON SPUTTERING; OXIDE FILMS; TEMPERATURE; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION ANALYSIS;

DC MAGNETRON SPUTTERING; DEPOSITION TEMPERATURES; INDIUM TIN OXIDE; INDIUM TIN OXIDE FILMS; LOW DEPOSITION TEMPERATURE; MATERIAL CHARACTERIZATION TECHNIQUES; MICRO-STRUCTURAL CHARACTERIZATION; THERMIONIC ENHANCEMENT;

TIN;

EID: 84899541403     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.vacuum.2014.03.018     Document Type: Article

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