Surface passivation of crystalline silicon by sputter deposited hydrogenated amorphous silicon

Physica Status Solidi - Rapid Research Letters

Volumn 8, Issue 3, 2014, Pages 231-234

  Zhang, Xinyu ^a   Hargreaves, Stuart ^a   Wan, Yimao ^a   Cuevas, Andres ^a  

^a AUSTRALIAN NATIONAL UNIVERSITY   (Australia)

Author keywords

Amorphous silicon; Hydrogen; Keywords solar cells; Sputtering; Surface passivation

Indexed keywords

AMORPHOUS SILICON; DEPOSITION; FOURIER TRANSFORM INFRARED SPECTROSCOPY; HETEROJUNCTIONS; HYDROGEN; HYDROGENATION; MAGNETRON SPUTTERING; PASSIVATION; PLASMA APPLICATIONS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SILICON; SOLAR CELLS; SPUTTERING;

CHEMICAL BONDING CONFIGURATION; CRYSTALLINE SILICON SURFACES; DEPOSITION TEMPERATURES; FOURIER TRANSFORM INFRA REDS; HYDROGEN PLASMA TREATMENTS; HYDROGENATED AMORPHOUS SILICON (A-SI:H) FILMS; PLASMA ENHANCED CHEMICAL VAPOUR DEPOSITIONS (PECVD); SURFACE PASSIVATION;

SILICON WAFERS;

EID: 84896051973     PISSN: 18626254     EISSN: 18626270     Source Type: Journal    
DOI: 10.1002/pssr.201308253     Document Type: Article

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