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Volumn 3, Issue 1, 2013, Pages 183-188

Process control of reactive sputter deposition of AlO x and improved surface passivation of crystalline silicon

Author keywords

Photovoltaic cells; process control; silicon; sputtering; surfaces

Indexed keywords

ALUMINIUM OXIDE; CRYSTALLINE SILICONS; DEPOSITION PRESSURES; DEPOSITION PROCESS; EFFECTIVE LIFETIME; FILM CHARACTERIZATIONS; LOW POWER; REACTIVE SPUTTER DEPOSITION; SILICON SURFACES; SPECTROSCOPY MEASUREMENTS; SPUTTERING TARGET; SURFACE PASSIVATION; SURFACE RECOMBINATION VELOCITIES; SURFACE RECOMBINATIONS; WAVE NUMBERS;

EID: 84871725573     PISSN: 21563381     EISSN: None     Source Type: Journal    
DOI: 10.1109/JPHOTOV.2012.2214765     Document Type: Article
Times cited : (21)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.