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Volumn 7, Issue 9, 2013, Pages 619-622

Plasma hydrogenated, reactively sputtered aluminium oxide for silicon surface passivation

Author keywords

Aluminium oxide; Hydrogenation; Silicon; Solar cells; Sputtering; Surface passivation

Indexed keywords

ALUMINIUM OXIDE; CRYSTALLINE SILICON WAFERS; EFFECTIVE LIFETIME; FTIR MEASUREMENTS; MINORITY CARRIER LIFETIMES; PLASMA HYDROGENATED; SILICON OXIDE LAYERS; SURFACE PASSIVATION;

EID: 84884179761     PISSN: 18626254     EISSN: 18626270     Source Type: Journal    
DOI: 10.1002/pssr.201308027     Document Type: Article
Times cited : (13)

References (16)
  • 6
    • 84884202994 scopus 로고    scopus 로고
    • Proc. 27th EUPVSEC, Frankfurt, Germany, 2012 1958-1962
    • G. Krugel, F. Wagner, J. Rentsch, and R. Preu, in: Proc. 27th EUPVSEC, Frankfurt, Germany, 2012, pp. 1958-1962.
    • Krugel, G.1    Wagner, F.2    Rentsch, J.3    Preu, R.4
  • 8
    • 84884203637 scopus 로고    scopus 로고
    • AJA-International-Inc., Machine Manual (2007)
    • AJA-International-Inc., Machine Manual (2007).
  • 12
    • 84884209828 scopus 로고    scopus 로고
    • Infrared Characterization for Microelectronics. (World Scientific Publishing Co. Pte. Ltd., Singapore, 1999)
    • W. S. Lau, Infrared Characterization for Microelectronics. (World Scientific Publishing Co. Pte. Ltd., Singapore, 1999).
    • Lau, W.S.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.