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Volumn 102, Issue 23, 2013, Pages

Amorphous/crystalline silicon interface defects induced by hydrogen plasma treatments

(7) Geissbühler, Jonas a De Wolf, Stefaan a Demaurex, Bénédicte a Seif, Johannes P a Alexander, Duncan T L a Barraud, Loris a Ballif, Christophe a

a EPFL (Switzerland)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTALLINE SILICON SURFACES; DEFECT CREATION; HIGH-EFFICIENCY; HIGH-QUALITY INTERFACE; HYDROGEN PLASMA TREATMENTS; PASSIVATION LAYER; SILICON HETEROJUNCTIONS; SILICON INTERFACE;

ETCHING; HETEROJUNCTIONS; HYDROGEN; PASSIVATION; PLASMA DEPOSITION; SILICON; SURFACE DEFECTS;

INTERFACES (MATERIALS);

EID: 84879106561 PISSN: 00036951 EISSN: None Source Type: Journal
DOI: 10.1063/1.4811253 Document Type: Article

Times cited : (94)

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