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Journal of Alloys and Compounds

Volumn 593, Issue , 2014, Pages 267-270

Nanostructured TiO2 thin film memristor using hydrothermal process

(4) Dongale, T D a Shinde, S S a Kamat, R K a Rajpure, K Y a

a SHIVAJI UNIVERSITY (India)

Author keywords

Hydrothermal process; Keywords; Memristors; Titanium oxide

Indexed keywords

DEVICE FABRICATIONS; HYDROTHERMAL PROCESS; KEYWORDS; LOW OPERATING VOLTAGE; OPTICAL REFLECTANCE; RESISTIVE SWITCHING BEHAVIORS; SPECTROSCOPIC REFLECTOMETERS; TETRAGONAL CRYSTAL STRUCTURE;

ATOMIC FORCE MICROSCOPY; MEMRISTORS; PASSIVE FILTERS; SWITCHING; SWITCHING SYSTEMS; TITANIUM OXIDES; X RAY DIFFRACTION;

TITANIUM DIOXIDE;

EID: 84893559361 PISSN: 09258388 EISSN: None Source Type: Journal
DOI: 10.1016/j.jallcom.2014.01.093 Document Type: Article

Times cited : (68)

References (25)

1
- 84856050263
- Springer New York
- L.O. Chua Cellular Nanoscale Sensory Wave Computing 1996 Springer New York
- (1996) Cellular Nanoscale Sensory Wave Computing
- Chua, L.O.¹

2
- 79959343594
- L. Liu, B. Chen, B. Gao, F. Zhang, Y. Chen, X. Liu, Y. Wang, R. Han, and J. Kang Appl. Phys. A 102 2011 991 996
- (2011) Appl. Phys. A , vol.102 , pp. 991-996
- Liu, L.¹ Chen, B.² Gao, B.³ Zhang, F.⁴ Chen, Y.⁵ Liu, X.⁶ Wang, Y.⁷ Han, R.⁸ Kang, J.⁹

3
- 79956111265
- Q. Xia Appl. Phys. A 102 2011 955 965
- (2011) Appl. Phys. A , vol.102 , pp. 955-965
- Xia, Q.¹

4
- 67650102619
- R. Waser, R. Dittmann, G. Staikov, and K. Szot Adv. Mater. 21 2009 2632
- (2009) Adv. Mater. , vol.21 , pp. 2632
- Waser, R.¹ Dittmann, R.² Staikov, G.³ Szot, K.⁴

5
- 79959654724
- Y.S. Kim, J.-S. Kim, J.S. Choi, I.R. Hwang, S.H. Hong, S.O. Kang, and B.H. Park Appl. Phys. Lett. 98 2011 192104
- (2011) Appl. Phys. Lett. , vol.98 , pp. 192104
- Kim, Y.S.¹ Kim, J.-S.² Choi, J.S.³ Hwang, I.R.⁴ Hong, S.H.⁵ Kang, S.O.⁶ Park, B.H.⁷

6
- 51649091348
- R. Dong, D.S. Lee, M.B. Pyun, M. Hasan, H.J. Choi, M.S. Jo, D.J. Seong, M. Chang, S.H. Heo, J.M. Lee, H.K. Park, and H. Hwang Appl. Phys. A 93 2008 409
- (2008) Appl. Phys. A , vol.93 , pp. 409
- Dong, R.¹ Lee, D.S.² Pyun, M.B.³ Hasan, M.⁴ Choi, H.J.⁵ Jo, M.S.⁶ Seong, D.J.⁷ Chang, M.⁸ Heo, S.H.⁹ Lee, J.M.¹⁰ Park, H.K.¹¹ Hwang, H.¹²

7
- 77956032359
- S. Kim, and Y.K. Choi IEEE Trans. Electron. Dev. 56 2009 3049 3054
- (2009) IEEE Trans. Electron. Dev. , vol.56 , pp. 3049-3054
- Kim, S.¹ Choi, Y.K.²

8
- 65249091964
- C. Lee, I. Kim, W. Choi, H. Shin, and J. Cho Langmuir 25 2009 4274 4278
- (2009) Langmuir , vol.25 , pp. 4274-4278
- Lee, C.¹ Kim, I.² Choi, W.³ Shin, H.⁴ Cho, J.⁵

9
- 84862811668
- N. Duraisamy, N.M. Muhammad, H.C. Kim, J.D. Jo, and K.H. Choi Thin Solid Films 520 2012 5070 5074
- (2012) Thin Solid Films , vol.520 , pp. 5070-5074
- Duraisamy, N.¹ Muhammad, N.M.² Kim, H.C.³ Jo, J.D.⁴ Choi, K.H.⁵

10
- 84856047834
- K.H. Choi, M. Mustafa, K. Rahman, B.K. Jeong, and Y.H. Doh Appl. Phys. A 106 2012 165 170
- (2012) Appl. Phys. A , vol.106 , pp. 165-170
- Choi, K.H.¹ Mustafa, M.² Rahman, K.³ Jeong, B.K.⁴ Doh, Y.H.⁵

11
- 79959353918
- J.J. Yang, J.P. Strachan, F. Miao, M.X. Zhang, M.D. Pickett, W. Yi, A.A. Douglas, G. Ohlberg, R. Medeiros-Ribeiro, and W. Stanley Appl. Phys. A 102 2011 785 789
- (2011) Appl. Phys. A , vol.102 , pp. 785-789
- Yang, J.J.¹ Strachan, J.P.² Miao, F.³ Zhang, M.X.⁴ Pickett, M.D.⁵ Yi, W.⁶ Douglas, A.A.⁷ Ohlberg, G.⁸ Medeiros-Ribeiro, R.⁹ Stanley, W.¹⁰

12
- 84869503271
- 10.1016/j.sse.2012.06.016
- S. Murali, J.S. Rajachidambaram, S.Y. Han, C.H. Chang, G.S. Herman, and J.F. Conley Jr. Solid-State Electronics 79 2013 248 252 10.1016/j.sse.2012.06. 016
- (2013) Solid-State Electronics , vol.79 , pp. 248-252
- Murali, S.¹ Rajachidambaram, J.S.² Han, S.Y.³ Chang, C.H.⁴ Herman, G.S.⁵ Conley, Jr.J.F.⁶

13
- 84893562083
- T. Prodromakis, and C. Toumazou IEEE 2010 936 939
- (2010) IEEE , pp. 936-939
- Prodromakis, T.¹ Toumazou, C.²

14
- 84994681056
- A. Talukdar, A.G. Radwan, and K.N. Salama Appl. Nanosci. 1 2011 143 145
- (2011) Appl. Nanosci. , vol.1 , pp. 143-145
- Talukdar, A.¹ Radwan, A.G.² Salama, K.N.³

15
- 80053923766
- F. Pincella, P. Camorani, and V. Erokhin Appl. Phys. A 104 2011 1039 1046
- (2011) Appl. Phys. A , vol.104 , pp. 1039-1046
- Pincella, F.¹ Camorani, P.² Erokhin, V.³

16
- 77955583956
- Q.F. Xia, J.J. Yang, W. Wu, X. Li, and R.S. Williams Nano Lett. 10 2010 2909 2914
- (2010) Nano Lett. , vol.10 , pp. 2909-2914
- Xia, Q.F.¹ Yang, J.J.² Wu, W.³ Li, X.⁴ Williams, R.S.⁵

17
- 35649027343
- F. Verbakel, S.C.J. Mesker, and R.A.J. Janssen J. Appl. Phys. 102 2007 083701
- (2007) J. Appl. Phys. , vol.102 , pp. 083701
- Verbakel, F.¹ Mesker, S.C.J.² Janssen, R.A.J.³

18
- 78651245656
- M. Fusi, E. Maccallini, T. Caruso, C.S. Casari, A. Li Bassi, C.E. Bottani, P. Rudolf, K.C. Prince, and R.G. Agostino Surf. Sci. 605 2011 333 340
- (2011) Surf. Sci. , vol.605 , pp. 333-340
- Fusi, M.¹ Maccallini, E.² Caruso, T.³ Casari, C.S.⁴ Li Bassi, A.⁵ Bottani, C.E.⁶ Rudolf, P.⁷ Prince, K.C.⁸ Agostino, R.G.⁹

19
- 77951694910
- J.S. Chen, Y.L. Tan, C.M. Li, Y.L. Cheah, D. Luan, S. Madhavi, F.Y.C. Boey, L.A. Archer, and X.W. Lou J. Am. Chem. Soc. 132 2010 6124 6130
- (2010) J. Am. Chem. Soc. , vol.132 , pp. 6124-6130
- Chen, J.S.¹ Tan, Y.L.² Li, C.M.³ Cheah, Y.L.⁴ Luan, D.⁵ Madhavi, S.⁶ Boey, F.Y.C.⁷ Archer, L.A.⁸ Lou, X.W.⁹

20
- 49349110128
- J. Wang, C.W. Wang, Y. Li, and W.M. Liu Thin Solid Films 516 2008 7689 7694
- (2008) Thin Solid Films , vol.516 , pp. 7689-7694
- Wang, J.¹ Wang, C.W.² Li, Y.³ Liu, W.M.⁴

21
- 77951175505
- M. Selmi, F. Chaabouni, M. Abaab, and B. Rezig Phys. Status Solidi C 5 2008 3368 3372
- (2008) Phys. Status Solidi C , vol.5 , pp. 3368-3372
- Selmi, M.¹ Chaabouni, F.² Abaab, M.³ Rezig, B.⁴

22
- 0031122187
- N. Benramdane, W.A. Murad, R.H. Misho, M. Ziane, and Z. Kebbab Mater. Chem. Phys. 48 1997 119 123
- (1997) Mater. Chem. Phys. , vol.48 , pp. 119-123
- Benramdane, N.¹ Murad, W.A.² Misho, R.H.³ Ziane, M.⁴ Kebbab, Z.⁵

23
- 43049126833
- D.B. Strukov, G.S. Sniker, D.R. Stewart, and R.S. Williams Nature 453 2008 80
- (2008) Nature , vol.453 , pp. 80
- Strukov, D.B.¹ Sniker, G.S.² Stewart, D.R.³ Williams, R.S.⁴

24
- 79955365914
- R. Mohan, and S.J. Kim Jpn. J. Appl. Phys. 50 2011 04DJ01
- (2011) Jpn. J. Appl. Phys. , vol.50
- Mohan, R.¹ Kim, S.J.²

25
- 66049144283
- R. Waser Microelectron. Eng. 86 2009 1925
- (2009) Microelectron. Eng. , vol.86 , pp. 1925
- Waser, R.¹

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