Annealing of RF-magnetron sputtered SnS2 precursors as a new route for single phase SnS thin films

Journal of Alloys and Compounds

Volumn 592, Issue , 2014, Pages 80-85

  Sousa, M G ^a   Da Cunha, A F ^a   Fernandes, P A ^a,b  

^a UNIVERSITY OF AVEIRO   (Portugal)

^b INSTITUTO SUPERIOR DE ENGENHARIA DO PORTO   (Portugal)

Author keywords

Annealing; Graphite box; RF magnetron sputtering; Single phase SnS; Sulphur flux; Tin sulphide thin films

Indexed keywords

ANNEALING TEMPERATURES; CONSTANT PRESSURES; INDIRECT TRANSITION; OPTICAL MEASUREMENT; RF-MAGNETRON SPUTTERING; SINGLE PHASE; SODA LIME GLASS SUBSTRATE; TIN SULPHIDE;

AMORPHOUS FILMS; ENERGY DISPERSIVE SPECTROSCOPY; EVAPORATION; GRAPHITE; MAGNETRONS; OPTICAL DATA PROCESSING; SCANNING ELECTRON MICROSCOPY; SUBSTRATES; SULFUR; THIN FILMS; TIN; VAPORS; X RAY DIFFRACTION;

ANNEALING;

EID: 84893054784     PISSN: 09258388     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jallcom.2013.12.200     Document Type: Review

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