Growth of dense Ti3SiC2 MAX phase films elaborated at room temperature by aerosol deposition method

Journal of the European Ceramic Society

Volumn 34, Issue 5, 2014, Pages 1063-1072

  Piechowiak, Malgorzata Anna ^a   Henon, Joseph ^a   Durand Panteix, Olivier ^b   Etchegoyen, Grégory ^b   Coudert, Valérie ^a   Marchet, Pascal ^a   Rossignol, Fabrice ^a  

^a UNIVERSITY OF LIMOGES   (France)

^b Centre de Transfert de Technologies Céramiques CTTC   (France)

Author keywords

Aerosol deposition method; Coating; Low temperature process; MAX phase

Indexed keywords

ADHESIVES; AEROSOLS; COATINGS; DEPOSITION RATES; FLOW OF GASES; NANOCRYSTALLITES; RESPIRATORY MECHANICS; SILICON COMPOUNDS; SUBSTRATES; TEMPERATURE; THICK FILMS; TITANIUM COMPOUNDS;

ADHESIVE INTERFACES; AEROSOL DEPOSITION METHOD; GLASS SUBSTRATES; HIGH DEPOSITION RATES; INTERNAL MICROSTRUCTURE; LOW- TEMPERATURE PROCESS; MAX-PHASE; PROCESSING PARAMETERS;

MORPHOLOGY;

EID: 84892481301     PISSN: 09552219     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jeurceramsoc.2013.11.019     Document Type: Article

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