Effects of interlayer roughness on deposition rate and morphology of aerosol-deposited Al 2O 3 thick films

Ceramics International

Volumn 38, Issue 7, 2012, Pages 5621-5627

  Kim, Chang Wan ^a   Choi, Joo Hyun ^b   Kim, Hyung Jun ^a   Lee, Dong Won ^a   Hyun, Chang Yong ^b   Nam, Song Min ^a  

^a Kwangwoon University   (South Korea)

^b Seoul National University of Science and Technology   (South Korea)

Author keywords

Aerosol deposition process; D. Al 2O 3; Deposition rate; Plasma electrolytic oxide coating; Roughness of substrate

Indexed keywords

3-DIMENSIONAL; AEROSOL DEPOSITION; COMPLEX SHAPES; D. AL 2O 3; ELECTROLYTIC OXIDES; PLASMA RESISTANCE; SURFACE AREA; WORKING TIME;

ATMOSPHERIC AEROSOLS; COMPOSITE FILMS; DEGRADATION; DEPOSITION RATES; FILM GROWTH; PLASMAS; PROTECTIVE COATINGS; RESPIRATORY MECHANICS; SUBSTRATES; SURFACE ROUGHNESS; THICK FILMS;

ALUMINUM;

EID: 84862667421     PISSN: 02728842     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.ceramint.2012.04.003     Document Type: Article

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