Rapid deposition process for zinc oxide film applications in pyroelectric devices

Smart Materials and Structures

Volumn 21, Issue 10, 2012, Pages

  Hsiao, Chun Ching ^a   Yu, Shih Yuan ^a  

^a NATIONAL FORMOSA UNIVERSITY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

AEROSOL DEPOSITION; DEPOSITION OF FILMS; DEPOSITION PROCESS; ENVIRONMENTALLY-FRIENDLY; HEAT ABSORPTION; HIGH TEMPERATURE; LASER ANNEALING; LOW TOXICITY; MANUFACTURING PROCESS; POLING PROCESS; PYROELECTRIC DEVICES; PYROELECTRIC FILMS; RAPID PROCESS; RESPONSIVITY; SEMICONDUCTIVITY; TEMPERATURE VARIATION RATE; ZNO FILMS;

CRYSTALLOGRAPHY; METALLIC FILMS; OXIDE FILMS; TEMPERATURE DISTRIBUTION;

ZINC OXIDE;

EID: 84865994333     PISSN: 09641726     EISSN: 1361665X     Source Type: Journal    
DOI: 10.1088/0964-1726/21/10/105012     Document Type: Article

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