Absorption of crystal/amorphous interfacial dislocations during in situ TEM nanoindentation of an Al thin film on Si

Scripta Materialia

Volumn 74, Issue , 2014, Pages 44-47

  De Knoop, Ludvig ^a   Legros, Marc ^a  

^a UNIVERSITÉ DE TOULOUSE   (France)

Author keywords

Aluminum; In situ TEM; Interfacial dislocations; Nanoindentation; Thin films

Indexed keywords

ALUMINUM; ALUMINUM METALLOGRAPHY; CRYSTALS; NANOINDENTATION; TRANSMISSION ELECTRON MICROSCOPY; FINITE ELEMENT METHOD; INTERFACES (MATERIALS); THIN FILMS;

AL FILMS; AL THIN FILMS; DIRECT OBSERVATIONS; FINITE ELEMENT MODELLING; IN-SITU TEM; INTERFACIAL DISLOCATIONS; METALLIC THIN FILMS; THREADING DISLOCATION; ROOM TEMPERATURE;

THIN FILMS; DISLOCATIONS (CRYSTALS);

EID: 84890968655     PISSN: 13596462     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.scriptamat.2013.10.003     Document Type: Article

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