Nanostructuring of free-standing, dielectric membranes using electron-beam lithography

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 31, Issue 6, 2013, Pages

  Grepstad, Jon Olav ^a   Greve, Martin M ^b   Reisinger, Thomas ^c   Holst, Bodil ^b  

^a NORWEGIAN UNIVERSITY OF SCIENCE AND TECHNOLOGY   (Norway)

^b UNIVERSITY OF BERGEN   (Norway)

^c KARLSRUHE INSTITUTE OF TECHNOLOGY   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ANTI REFLECTIVE COATINGS; DIELECTRIC MEMBRANES; ETCHED STRUCTURES; FABRICATION METHOD; HIGH ASPECT RATIO; HIGH ASPECT RATIO STRUCTURES; NANOSTRUCTURED DIELECTRICS; PATTERN TRANSFERS;

ASPECT RATIO; ELECTRON BEAM LITHOGRAPHY; ESTERS; OPTICS;

MEMBRANES;

EID: 84890063393     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.4820019     Document Type: Article

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