Nanostructuring of zone plates for helium atom beam focusing

Microelectronic Engineering

Volumn 53, Issue 1, 2000, Pages 685-688

  Rehbein, S ^a   Doak, R B ^b,c,d   Grisenti, R E ^c   Schmahl, G ^a   Toennies, J P ^c   Woll Ch ^d  

^a UNIVERSITY OF GÖTTINGEN   (Germany)

^b ARIZONA STATE UNIVERSITY   (United States)

^c MAX PLANCK INSTITUTE FOR DYNAMICS AND SELF ORGANIZATION   (Germany)

^d RUHR UNIVERSITY BOCHUM   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ACTIVATION ENERGY; ATOMIC BEAMS; DIFFRACTION GRATINGS; ELECTRON BEAM LITHOGRAPHY; HELIUM; MASKS; NANOTECHNOLOGY; PLATE METAL; POLYMETHYL METHACRYLATES; REACTIVE ION ETCHING; SILICON WAFERS;

CONTINUOUS PATH CONTROL; FREE STANDING SILICON ZONE PLATE; FREE STANDING ZONE PLATE; HELIUM ATOM BEAM FOCUSING; MONOCHROMATIZE ATOM BEAM; ZONE PLATE;

MICROELECTRONIC PROCESSING;

EID: 0034206990     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(00)00405-6     Document Type: Article

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