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Volumn 87, Issue 5-8, 2010, Pages 1011-1014

Free-standing silicon-nitride zoneplates for neutral-helium microscopy

Author keywords

Atom optics; Fresnel Zoneplate; Helium; Silicon nitride; Supersonic expansion beam

Indexed keywords

ATOM OPTICS; CHEMICAL INERTNESS; FABRICATION PROCESS; FIRST-ORDER; FOCUSING ELEMENTS; FRESNEL; FRESNEL LENS; FRESNEL ZONEPLATE; GROUND-STATE HELIUM; IMAGING PROBE; LOW ENERGIES; MICROSCOPY TECHNIQUE; NEUTRAL ATOMS; NEW PROCESS; SAMPLE SURFACE; SUPERSONIC-EXPANSION BEAM; TRANSMISSION CHARACTERISTICS;

EID: 76949089841     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2009.11.107     Document Type: Article
Times cited : (35)

References (7)
  • 1
    • 37349022218 scopus 로고    scopus 로고
    • Imaging with neutral atoms - a new matter-wave microscope
    • see also Nature Research Highlights: Nature 451 (2008) 226-227
    • Koch M., Rehbein S., Schmahl G., Reisinger T., Bracco G., Ernst W.E., and Holst B. Imaging with neutral atoms - a new matter-wave microscope. J. Microsc. (Cover Story) 229 (2008) 1 see also Nature Research Highlights: Nature 451 (2008) 226-227
    • (2008) J. Microsc. (Cover Story) , vol.229 , pp. 1
    • Koch, M.1    Rehbein, S.2    Schmahl, G.3    Reisinger, T.4    Bracco, G.5    Ernst, W.E.6    Holst, B.7
  • 2
    • 0030807882 scopus 로고    scopus 로고
    • An atom-focusing mirror
    • Holst B., and Allison W. An atom-focusing mirror. Nature 390 (1997) 244
    • (1997) Nature , vol.390 , pp. 244
    • Holst, B.1    Allison, W.2
  • 4
    • 0038702309 scopus 로고    scopus 로고
    • Nanofabrication of diffractive optics for soft X-ray and atom beam focusing
    • Rehbein S. Nanofabrication of diffractive optics for soft X-ray and atom beam focusing. J. Phys. IV France 104 (2003) 207
    • (2003) J. Phys. IV France , vol.104 , pp. 207
    • Rehbein, S.1
  • 7
    • 0942278362 scopus 로고    scopus 로고
    • Nanometer-level stitching in raster-scanning e-beam lithography using spatial-phase locking
    • Hastings J., Zhang F., and Smith H. Nanometer-level stitching in raster-scanning e-beam lithography using spatial-phase locking. J. Vac. Sci. Technol. B 21 (2003) 2650-2656
    • (2003) J. Vac. Sci. Technol. B , vol.21 , pp. 2650-2656
    • Hastings, J.1    Zhang, F.2    Smith, H.3


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.