Reduction of proximity effect in electron beam lithography by deposition of a thin film of silicon dioxide

Korean Journal of Chemical Engineering

Volumn 25, Issue 2, 2008, Pages 373-376

  Seo, Chang Ho ^a   Suh, Kahp Yang ^a  

^a Seoul National University   (South Korea)

Author keywords

Electron Beam Lithography (EBL); Proximity effect; Silicon dioxide; Thin film

Indexed keywords

EID: 43949137913     PISSN: 02561115     EISSN: None     Source Type: Journal    
DOI: 10.1007/s11814-008-0062-x     Document Type: Article

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