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Volumn 2, Issue 1, 2014, Pages 98-108

A simple approach to the fabrication of fluorine-doped zinc oxide thin films by atomic layer deposition at low temperatures and an investigation into the growth mode

Author keywords

[No Author keywords available]

Indexed keywords

FIELD EMISSION SCANNING ELECTRON MICROSCOPY; FLUORINE CONCENTRATIONS; LOW DEPOSITION TEMPERATURE; LOW-TEMPERATURE FABRICATION; OXYGEN-RELATED DEFECTS; STRUCTURAL AND MORPHOLOGICAL PROPERTIES; WIDE-ANGLE X-RAY DIFFRACTION; ZINC OXIDE THIN FILMS;

EID: 84889076570     PISSN: 20507534     EISSN: 20507526     Source Type: Journal    
DOI: 10.1039/c3tc31478b     Document Type: Article
Times cited : (79)

References (36)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.