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Volumn 63, Issue 18-19, 2009, Pages 1621-1623
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Formation of F-doped ZnO transparent conductive films by sputtering of ZnF2
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Author keywords
Deposition; F doped ZnO; Sputtering; Thin films
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Indexed keywords
DOPED ZNO;
ENERGY BANDGAP;
F-DOPED ZNO;
FLUORINE-DOPED ZNO;
GLASS SUBSTRATES;
OPTICAL AND ELECTRICAL PROPERTIES;
RADIO FREQUENCY MAGNETRON SPUTTERING;
THERMAL-ANNEALING;
TRANSPARENT CONDUCTIVE FILMS;
TRANSPARENT CONDUCTIVE THIN FILMS;
VISIBLE REGION;
ZNO;
CARRIER CONCENTRATION;
ELECTRIC PROPERTIES;
FLUORINE;
FLUORINE COMPOUNDS;
METALLIC FILMS;
OPTICAL FILMS;
RAPID THERMAL ANNEALING;
RAPID THERMAL PROCESSING;
SEMICONDUCTING ZINC COMPOUNDS;
THIN FILMS;
ZINC OXIDE;
CONDUCTIVE FILMS;
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EID: 65749083710
PISSN: 0167577X
EISSN: None
Source Type: Journal
DOI: 10.1016/j.matlet.2009.04.032 Document Type: Article |
Times cited : (26)
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References (17)
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