Growth of Boron-doped ZnO thin films by atomic layer deposition

Solar Energy Materials and Solar Cells

Volumn 49, Issue 1-4, 1997, Pages 19-26

  Sang, Baosheng ^a   Yamada, Akira ^a   Konagai, Makoto ^a  

^a TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

Atomic layer deposition; Transparent conductive oxide; ZnO

Indexed keywords

BORON; DEPOSITION; ELECTRIC CONDUCTIVITY MEASUREMENT; ELECTRIC PROPERTIES; ELECTRON TRANSPORT PROPERTIES; FILM GROWTH; ZINC OXIDE;

ATOMIC LAYER DEPOSITION; DIETHYLZINC; ELECTRON MOBILITY; TRANSPARENT CONDUCTIVE OXIDE;

CONDUCTIVE FILMS;

EID: 0031364609     PISSN: 09270248     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0927-0248(97)00171-2     Document Type: Article

References (4)

1. W.W. Wenas, K. Dairiki, A. Yamada, M. Konagai, K. Takahashi, Proc. 1st WorldPVSEC, Hawaii, 1994, p. 78.
2. B. Sang, M. Konagai, Proc. 25th IEEE Photovoltaic Specialists Conf., Washington, 1996. p. 1085.
3. A. Yamada, W.W, Wenas, M. Konagai, K. Takashi, Jpn. J. Appl. Phys. 30 (1996) L1152.
4. W.W. Wenas, M. Yoshino, A. Yamada, M. Konagai, K. Takahashi, J. Appl. Phys. 70 (1991) 7119.