Slow DNA transport through nanopores in hafnium oxide membranes

ACS Nano

Volumn 7, Issue 11, 2013, Pages 10121-10128

  Larkin, Joseph ^a   Henley, Robert ^a   Bell, David C ^b   Cohen Karni, Tzahi ^c   Rosenstein, Jacob K ^d   Wanunu, Meni ^a  

^a NORTHEASTERN UNIVERSITY   (United States)

^b HARVARD UNIVERSITY   (United States)

^c MASSACHUSETTS INSTITUTE OF TECHNOLOGY   (United States)

^d Brown University   (United States)

Author keywords

atomic layer deposition; DNA sequencing; single molecule; translocations

Indexed keywords

DNA SEQUENCING; DNA TRANSLOCATION; OXIDE MEMBRANE; PHYSICO-CHEMICAL INTERACTIONS; PORE-EXPANSION; SINGLE-MOLECULE; SINGLE-STRANDED DNA; TRANSLOCATIONS;

ATOMIC LAYER DEPOSITION; DNA; DNA SEQUENCES; HAFNIUM OXIDES; OXIDES; SILICON NITRIDE;

NANOPORES;

ARTIFICIAL MEMBRANE; BIOPOLYMER; DNA; HAFNIUM; HAFNIUM OXIDE; OXIDE; POLITEF; SILICON DERIVATIVE; SILICON NITRIDE; SINGLE STRANDED DNA;

ARTIFICIAL MEMBRANE; CHEMISTRY; GENETIC PROCEDURES; MATERIALS TESTING; NANOPORE; NANOTECHNOLOGY; PROCEDURES; SCANNING ELECTRON MICROSCOPY; SURFACE PROPERTY; TRANSMISSION ELECTRON MICROSCOPY; TRANSPORT AT THE CELLULAR LEVEL;

BIOLOGICAL TRANSPORT; BIOPOLYMERS; BIOSENSING TECHNIQUES; DNA; DNA, SINGLE-STRANDED; HAFNIUM; MATERIALS TESTING; MEMBRANES, ARTIFICIAL; MICROSCOPY, ELECTRON, SCANNING; MICROSCOPY, ELECTRON, TRANSMISSION; NANOPORES; NANOTECHNOLOGY; OXIDES; POLYTETRAFLUOROETHYLENE; SILICON COMPOUNDS; SURFACE PROPERTIES;

MLCS; MLOWN;

EID: 84888872064     PISSN: 19360851     EISSN: 1936086X     Source Type: Journal    
DOI: 10.1021/nn404326f     Document Type: Article

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