Mechanical property characterization of LPCVD silicon nitride thin films at cryogenic temperatures

Journal of Microelectromechanical Systems

Volumn 13, Issue 5, 2004, Pages 870-879

  Chuang, Wen Hsien ^a   Luger, Thomas ^a   Fettig, Rainer K ^b   Ghodssi, Reza ^a  

^a UNIVERSITY OF MARYLAND   (United States)

^b NONE

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; CRYOGENICS; ELASTIC MODULI; ELECTRIC POTENTIAL; FRACTURE TOUGHNESS; FUNCTION GENERATORS; HELIUM; ION BEAMS; LEAD COMPOUNDS; SILICON NITRIDE; TEMPERATURE; THIN FILMS;

CRYOGENIC TEMPERATURES; FOCUSED ION BEAM (FIB);

MICROELECTROMECHANICAL DEVICES;

EID: 7444223603     PISSN: 10577157     EISSN: None     Source Type: Journal    
DOI: 10.1109/JMEMS.2004.836815     Document Type: Article

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