Chemical and optical characterisation of atomic layer deposition aluminium doped ZnO films for photovoltaics by glow discharge optical emission spectrometry

Journal of Analytical Atomic Spectrometry

Volumn 26, Issue 4, 2011, Pages 822-827

  Schmitt, S W ^a   Gamez, G ^a   Sivakov, V ^b   Schubert, M ^b   Christiansen, S H ^b,c   Michler, J ^a  

^a SWISS FEDERAL LABORATORIES FOR MATERIALS SCIENCE AND TECHNOLOGY   (Switzerland)

^b MAX PLANCK INSTITUTE FOR THE SCIENCE OF LIGHT   (Germany)

^c LEIBNIZ INSTITUTE OF PHOTONIC TECHNOLOGY   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

AL CONTENT; ALLOY FILM; ANALYSIS TECHNIQUES; AZO FILMS; CHEMICAL COMPOSITIONS; DOPED ZNO; ELLIPSOMETRY MEASUREMENTS; FILM COMPOSITION; GLOW DISCHARGE OPTICAL EMISSION SPECTROMETRIES; HOMOGENEOUS FILMS; MEASUREMENT PROCEDURES; OPTICAL CHARACTERISATION; PHOTOVOLTAIC THIN FILMS; PHOTOVOLTAICS; SPECTRAL LINE;

ALUMINUM; ATOMIC LAYER DEPOSITION; GLOW DISCHARGES; LIGHT EMISSION; LIGHT REFRACTION; METALLIC FILMS; ORGANIC POLYMERS; PHOTOVOLTAIC EFFECTS; REFRACTIVE INDEX; REFRACTOMETERS; SPECTROMETRY; SPECTROSCOPY; ZINC OXIDE;

OPTICAL EMISSION SPECTROSCOPY;

EID: 79953035941     PISSN: 02679477     EISSN: 13645544     Source Type: Journal    
DOI: 10.1039/c0ja00158a     Document Type: Conference Paper

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