Electrical characterization of Ag:TiN thin films produced by glancing angle deposition

Materials Letters

Volumn 115, Issue , 2014, Pages 136-139

  Pedrosa, P ^a,b,c   Lopes, C ^c   Martin, N ^d   Fonseca, C ^a,b   Vaz, F ^c  

^a UNIVERSITY OF COIMBRA   (Portugal)

^b UNIVERSITY OF PORTO   (Portugal)

^c UNIVERSITY OF MINHO   (Portugal)

^d FEMTO ST INSTITUTE   (France)

Author keywords

Glancing Angle Deposition; Resistivity; Silver doping; Titanium nitride

Indexed keywords

ANGLE OF INCIDENCE; COLUMNAR MICROSTRUCTURES; D.C. MAGNETRON SPUTTERING; ELECTRICAL CHARACTERIZATION; GLANCING ANGLE DEPOSITION; POROUS MICROSTRUCTURE; RESISTIVITY VALUES; SILVER-DOPING;

DEPOSITION; ELECTRIC CONDUCTIVITY; ELECTRIC PROPERTIES; METALLIC FILMS; MICROSTRUCTURE; SEMICONDUCTOR DOPING; SUBSTRATES; TITANIUM NITRIDE;

SILVER;

EID: 84887294346     PISSN: 0167577X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.matlet.2013.10.044     Document Type: Article

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